Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Self-odor-removing nail polish and preparation method thereof

A nail polish and formula technology, applied in manicure, pedicure, pharmaceutical formulations, etc., can solve problems such as being harmful to nails and the human body, and that small molecules cannot be naturally volatilized and blocked, and achieve the effect of reducing harmful substances

Inactive Publication Date: 2018-11-23
广州市精合致新材料科技有限公司
View PDF5 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Traditional self-cleaning nail polish has the following disadvantages: After forming a multi-layer coating structure, the remaining small molecules after curing are blocked by the surface coating, resulting in small molecules not being able to volatilize naturally, which is harmful to nails and the human body

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-odor-removing nail polish and preparation method thereof
  • Self-odor-removing nail polish and preparation method thereof
  • Self-odor-removing nail polish and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] A preparation method of self-cleaning flavor nail polish, comprising the following steps:

[0029] S1: Put 30 parts of urethane acrylate, 10 parts of modified epoxy acrylate and 30 parts of hydroxyethyl methacrylate into the reaction vessel according to the formula; use FS30 double-shaft frequency conversion speed regulation mixer produced by Dongguan Litengda Intelligent Equipment Co., Ltd. , stirring at a speed of 1000-1500 rpm for 15-30 minutes;

[0030] S2: Add 5 parts of nanoscale tourmaline powder and 5 parts of lanthanide cerium group rare earth; use FS30 dual-axis frequency conversion speed regulation mixer produced by Dongguan Litengda Intelligent Equipment Co., Ltd., stir at 2000-3000 rpm for 30- 60 minutes;

[0031] S3: Add 2 parts of 1-hydroxycyclohexyl phenyl ketone, 2 parts of phenylbis(2,4,6-trimethylbenzoyl) phosphine oxide, 1 part of Degussa R974 fumed silica, 0.1 part of tego920 defoamer and 0.1 part of tego450 leveling agent; stir at a speed of 1000...

Embodiment 2

[0038] A preparation method of self-cleaning flavor nail polish, comprising the following steps:

[0039] S1: Put 40 parts of urethane acrylate, 20 parts of modified epoxy acrylate and 40 parts of hydroxyethyl methacrylate into the reaction vessel according to the formula; use FS30 double-shaft frequency conversion speed regulation mixer produced by Dongguan Litengda Intelligent Equipment Co., Ltd. , stirring at a speed of 1000-1500 rpm for 15-30 minutes;

[0040] S2: Then add 15 parts of nanoscale tourmaline powder and 10 parts of lanthanide cerium group rare earth; use the FS30 dual-axis frequency conversion speed regulation mixer produced by Dongguan Litengda Intelligent Equipment Co., Ltd., and stir at 2000-3000 rpm for 30- 60 minutes;

[0041] S3: add 4 parts of 1-hydroxycyclohexyl phenyl ketone, 10 parts of phenyl bis(2,4,6-trimethylbenzoyl) phosphine oxide, 2 parts of Degussa R974 fumed silica, 1 part of tego920 defoamer and 1 part of tego450 leveling agent; stir at a...

Embodiment 3

[0049] A preparation method of self-cleaning flavor nail polish, comprising the following steps:

[0050] S1: Put 35 parts of urethane acrylate, 15 parts of modified epoxy acrylate and 35 parts of hydroxyethyl methacrylate into the reaction vessel according to the formula; use FS30 double-shaft frequency conversion speed regulation mixer produced by Dongguan Litengda Intelligent Equipment Co., Ltd. , stirring at a speed of 1000-1500 rpm for 15-30 minutes;

[0051] S2: Then add 10 parts of nanoscale tourmaline powder and 8 parts of lanthanide cerium group rare earth; use the FS30 dual-axis frequency conversion speed regulation mixer produced by Dongguan Litengda Intelligent Equipment Co., Ltd., and stir at 2000-3000 rpm for 30- 60 minutes;

[0052] S3: Add 3 parts of 1-hydroxycyclohexyl phenyl ketone, 6 parts of phenyl bis(2,4,6-trimethylbenzoyl) phosphine oxide, 1.5 parts of Degussa R974 fumed silica, 0.5 parts of tego920 defoamer and 0.5 parts of tego450 leveling agent; sti...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a preparation method of a self-odor-removing nail polish. The preparation method of the self-odor-removing nail polish comprises following steps: S1: adding 30-40 parts of urethane acrylate, 10-20 parts of modified epoxy acrylate and 30-40 parts of hydroxyethyl methylacrylate into a reaction vessel and stirring quickly for 15-30 min with the rotating speed of 1000-1500 r / min; S2: adding 5-15 parts of tourmaline powder and 5-10 parts of lanthanide series light rare earth and stirring quickly for 30-60 min with the speed of 2000-3000 r / min; S3: adding 2-4 parts of 1-hydroxy cyclohexyl phenyl ketone, 2-10 parts of phenyl bis (2,4,6-trimethylbenzoyl) phosphine oxide, 1-2 parts of silica soot, 0.5-1 part of defoamer and 0-1 part of flatting agent and stirring with the speed of 1,000-1,500 r / min; S4: grinding to a mean grain size of no more than 5 micrometers with a three-roll grinder; the self-odor-removing nail polish can be cured rapidly only upon UV / LED light irradiation with dense coating and bright color; the self-odor-removing nail polish is environmentally friendly and has good flexibility, good adhesion between coatings layers, and can remove odor automatically and release anion.

Description

technical field [0001] The invention belongs to the field of cosmetics, in particular to a self-cleaning flavor nail polish and a preparation method thereof. Background technique [0002] Self-cleaning nail polish gel is a new environmentally friendly cosmetic that replaces nail polish. It is self-developed because of its simple operation, good durability, bright gloss and color, low odor, less irritating to the human body, and shorter time limit during operation. , and it is not easy to deteriorate, and it is more convenient to store, so it is more widely used, and the dosage is increasing year by year, becoming a must-choice product for most beauty-loving women. [0003] Since the self-cleaning nail polish is cured under UV / LED lamps, usually the self-cleaning nail polish is composed of acrylate oligomers, methacrylic acid oligomers or epoxy oligomers and monomers that constitute subsequent crosslinking reactions. body and additives. When applied to nails, self-cleaning ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/19A61K8/25A61K8/35A61K8/37A61K8/55A61K8/81A61K8/87A61Q3/02
CPCA61Q3/02A61K8/19A61K8/25A61K8/35A61K8/37A61K8/55A61K8/8152A61K8/87
Inventor 张家春杜雨宸杜红赞何峰杜红波
Owner 广州市精合致新材料科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com