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High performance memristive device based on metal oxide oxygen concentration gradient and its fabrication

A technology of memristive devices and oxides, applied in electrical components and other directions, can solve problems such as increased power consumption, discrete distribution, and increased circuit area, and achieve the effects of preventing electrical crosstalk, long retention time, and high computing speed.

Active Publication Date: 2020-07-10
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the difficulty in controlling the on-off of the conductive thread, the on-off of the localized conductive path has great randomness, which leads to discrete distribution of on / off voltage and high and low resistance values, which can be used for integrated crossbar structures due to electrical crosstalk ( The problem of crosstalk) is likely to cause misreading and increased power consumption caused by leakage current. It is usually necessary to design complex peripheral circuits to improve the recognition accuracy, which not only increases the cost but also increases the circuit area;
[0004] In order to improve the stability, the limiting current can be increased to the mA level to obtain a lower resistance state, but at the same time the power consumption is increased, which makes it difficult to realize the commercialization of the device with high power consumption in terms of integration; moreover, according to The energy requirements of memristor switching characteristics, that is, voltage pulse width × voltage amplitude, when the pulse width drops to 100ns or even 10ns, the voltage amplitude will increase significantly, making it difficult to achieve low power consumption of the chip, which is not conducive to the integration of high-speed chip circuits and the fusion of computing and storage

Method used

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  • High performance memristive device based on metal oxide oxygen concentration gradient and its fabrication
  • High performance memristive device based on metal oxide oxygen concentration gradient and its fabrication
  • High performance memristive device based on metal oxide oxygen concentration gradient and its fabrication

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preparation example Construction

[0045] Generally speaking, the preparation method can be specifically prepared by sputtering to prepare the lower electrode, on the lower electrode, the functional layer is prepared by photolithography, sputtering, and peeling, and on the functional layer, the upper electrode is prepared by photolithography, sputtering, and peeling. , so as to form a memristor device with a three-layer structure; among them, when preparing the functional layer by sputtering, it is necessary to adjust Ar and O during the sputtering process 2 The proportion of oxygen concentration gradient functional layer. For example, the following steps may be included:

[0046] (1) preparing the lower electrode;

[0047] By the method of magnetron sputtering, SiO is grown on one side polished 2 A layer of metal lower electrode is grown on the monocrystalline silicon substrate, and the obtained lower electrode film can cover the entire substrate surface, and the total thickness can be 50nm-200nm;

[0048] ...

Embodiment 1

[0067] Taking a tantalum-based memristive device as an example, the corresponding preparation method may include the following steps:

[0068] (1) preparing the lower electrode;

[0069] In the experiment, Ta was selected as the lower electrode, and SiO was grown on one side by magnetron sputtering. 2 A lower electrode is grown on a single crystal silicon substrate.

[0070] (1.1) Substrate cleaning: first use acetone to clean in an ultrasonic environment for 10 minutes, then use alcohol to clean in an ultrasonic environment for 10 minutes, and finally use deionized water to ultrasonically clean for 10 minutes, and the ultrasonic power is 60W;

[0071] (1.2) Sputtering: under a DC sputtering power of 100W, a 100nm Ta bottom electrode was grown by sputtering for 370s in an Ar gas atmosphere of 0.5Pa;

[0072] (2) preparing a functional layer;

[0073] The functional layer is made of TaOx material, and the TaOx material with oxygen concentration gradient is obtained by contro...

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Abstract

The invention discloses a high-performance memristive device based on a metal oxide oxygen concentration gradient and its preparation, wherein the device unit of the memristor includes an upper electrode, a functional layer and a lower electrode from top to bottom, and the functional layer is a metal Oxygen, the oxygen content in the functional layer changes in a gradient. The present invention improves the internal composition of the key functional layer in the memristor and its preparation method, and uses the metal oxide with a gradient change in oxygen content as the functional layer, so that the on-off of the localized conductive filament depends on the high oxygen content. The area suppresses the random on-off of the conductive channel, which can improve the stability, consistency and switching speed of the memristive device. It can increase the high / low resistance state while reducing the current limit to reduce power consumption. The functional layer based on the oxygen concentration gradient is easy to form a tapered conductive channel, and the cone top of the conductive channel with high oxygen content has the characteristics of easy on-off, which can realize high-speed resistance switching under low-voltage operation.

Description

technical field [0001] The invention belongs to the technical field of microelectronic devices, and more specifically relates to a high-performance memristive device based on a metal oxide oxygen concentration gradient and its preparation. The memristor can utilize oxygen concentration gradients such as TaOx, HfOx, AlOx, and CuOx The dielectric material is a resistance switching functional layer, which realizes the device function of the memristor. Background technique [0002] According to their different performance characteristics, memristors can be divided into continuously adjustable resistance gradual change and resistance sudden change. The former has proven to have great application prospects in simulating neuron synapses, and the latter can be applied to data storage; due to its non-volatile, low power consumption, and high switching characteristics at the nanosecond level, it can not only be used as a download to replace Flash A generation of memory, and has great...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L45/00
CPCH10N70/00
Inventor 孙华军王标李兆男缪向水
Owner HUAZHONG UNIV OF SCI & TECH
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