Strength and toughness integrated fullerene-like carbon-nitrogen multilayer composite film and preparation method thereof
A fullerene carbon-nitrogen layer, fullerene carbon-nitrogen technology, applied in coating, metal material coating process, ion implantation plating, etc. Residual stress and other problems, to achieve the effect of preventing crack propagation, reducing internal stress, and the method is simple and easy to control
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Embodiment 1
[0025] A preparation method of a strong and tough integrated fullerene-like carbon-nitrogen multilayer composite film described in this embodiment:
[0026] (1) 9Cr18 stainless steel material was used as the substrate. Before the experiment, the substrate material was ground with sandpaper and mechanically polished, placed in acetone solution for ultrasonic cleaning for 5 minutes, then cleaned in alcohol solution for 5 minutes, dried with a hair dryer, put into a vacuum chamber, and pumped. Vacuum to a vacuum below 3×10 -3 Pa.
[0027] (2) Argon gas of 0.5 Pa is introduced into the coating vacuum chamber, and a pulse bias voltage of -1200V is applied to the substrate, and the anode layer ion beam source is used to ionize argon ions to etch and clean the substrate surface for 20 minutes, and the voltage of the anode layer ion beam source is set to 1000V .
[0028] (3) 50SCCM argon gas is introduced into the coating chamber, the argon gas pressure is 0.5Pa ~ 1.0Pa, the substra...
Embodiment 2
[0039] A preparation method of a strong and tough integrated fullerene-like carbon-nitrogen multilayer composite film described in this embodiment:
[0040] (1) With cemented carbide as the base material, the base material was ground with sandpaper and mechanically polished before the experiment, placed in an acetone solution for ultrasonic cleaning for 5 minutes, then cleaned in an alcohol solution for 5 minutes, dried with a hair dryer, and then put into a vacuum chamber. Vacuum to make the vacuum less than 3×10 -3 Pa.
[0041](2) Argon gas of 0.5 Pa is introduced into the coating vacuum chamber, and a pulse bias voltage of -1200V is applied to the substrate, and the anode layer ion beam source is used to ionize argon ions to etch and clean the substrate surface for 25 minutes, and the voltage of the anode layer ion beam source is set to 1100V .
[0042] (3) 50SCCM argon gas is introduced into the coating chamber, the argon gas pressure is 0.5Pa ~ 1.0Pa, the substrate is a...
Embodiment 3
[0053] A preparation method of a strong and tough integrated fullerene-like carbon-nitrogen multilayer composite film described in this embodiment:
[0054] (1) The high-speed steel material was used as the substrate. Before the experiment, the substrate material was ground with sandpaper and mechanically polished, placed in an acetone solution for ultrasonic cleaning for 5 minutes, and then cleaned in an alcohol solution for 5 minutes. After drying with a hair dryer, put it into a vacuum chamber and pump it. Vacuum to a vacuum below 3×10 -3 Pa.
[0055] (2) Argon gas of 0.5 Pa is introduced into the coating vacuum chamber, and a pulse bias voltage of -1200V is applied to the substrate, and the anode layer ion beam source is used to ionize argon ions to etch and clean the substrate surface for 30 minutes, and the voltage of the anode layer ion beam source is set to 1200V .
[0056] (3) 50SCCM argon gas is introduced into the coating chamber, the argon gas pressure is 0.5Pa ~...
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Abstract
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