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Strength and toughness integrated fullerene-like carbon-nitrogen multilayer composite film and preparation method thereof

A fullerene carbon-nitrogen layer, fullerene carbon-nitrogen technology, applied in coating, metal material coating process, ion implantation plating, etc. Residual stress and other problems, to achieve the effect of preventing crack propagation, reducing internal stress, and the method is simple and easy to control

Active Publication Date: 2018-06-05
LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the preparation of fullerene-like films with high hardness and high elastic modulus tends to cause peeling failure of the film on metal substrates with relatively low hardness and elastic modulus.
A large number of research results at home and abroad show that the important reason for the failure of the film is the large residual stress and the poor bonding force between the film and the substrate, which leads to the peeling of the film and the substrate.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A preparation method of a strong and tough integrated fullerene-like carbon-nitrogen multilayer composite film described in this embodiment:

[0026] (1) 9Cr18 stainless steel material was used as the substrate. Before the experiment, the substrate material was ground with sandpaper and mechanically polished, placed in acetone solution for ultrasonic cleaning for 5 minutes, then cleaned in alcohol solution for 5 minutes, dried with a hair dryer, put into a vacuum chamber, and pumped. Vacuum to a vacuum below 3×10 -3 Pa.

[0027] (2) Argon gas of 0.5 Pa is introduced into the coating vacuum chamber, and a pulse bias voltage of -1200V is applied to the substrate, and the anode layer ion beam source is used to ionize argon ions to etch and clean the substrate surface for 20 minutes, and the voltage of the anode layer ion beam source is set to 1000V .

[0028] (3) 50SCCM argon gas is introduced into the coating chamber, the argon gas pressure is 0.5Pa ~ 1.0Pa, the substra...

Embodiment 2

[0039] A preparation method of a strong and tough integrated fullerene-like carbon-nitrogen multilayer composite film described in this embodiment:

[0040] (1) With cemented carbide as the base material, the base material was ground with sandpaper and mechanically polished before the experiment, placed in an acetone solution for ultrasonic cleaning for 5 minutes, then cleaned in an alcohol solution for 5 minutes, dried with a hair dryer, and then put into a vacuum chamber. Vacuum to make the vacuum less than 3×10 -3 Pa.

[0041](2) Argon gas of 0.5 Pa is introduced into the coating vacuum chamber, and a pulse bias voltage of -1200V is applied to the substrate, and the anode layer ion beam source is used to ionize argon ions to etch and clean the substrate surface for 25 minutes, and the voltage of the anode layer ion beam source is set to 1100V .

[0042] (3) 50SCCM argon gas is introduced into the coating chamber, the argon gas pressure is 0.5Pa ~ 1.0Pa, the substrate is a...

Embodiment 3

[0053] A preparation method of a strong and tough integrated fullerene-like carbon-nitrogen multilayer composite film described in this embodiment:

[0054] (1) The high-speed steel material was used as the substrate. Before the experiment, the substrate material was ground with sandpaper and mechanically polished, placed in an acetone solution for ultrasonic cleaning for 5 minutes, and then cleaned in an alcohol solution for 5 minutes. After drying with a hair dryer, put it into a vacuum chamber and pump it. Vacuum to a vacuum below 3×10 -3 Pa.

[0055] (2) Argon gas of 0.5 Pa is introduced into the coating vacuum chamber, and a pulse bias voltage of -1200V is applied to the substrate, and the anode layer ion beam source is used to ionize argon ions to etch and clean the substrate surface for 30 minutes, and the voltage of the anode layer ion beam source is set to 1200V .

[0056] (3) 50SCCM argon gas is introduced into the coating chamber, the argon gas pressure is 0.5Pa ~...

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Abstract

The invention relates to a strength and toughness integrated fullerene-like carbon-nitrogen multilayer composite film and a preparation method thereof and belongs to the technical field of surface engineering. The film structure comprises a metal matrix, a soft-hard alternate transition layer and a fullerene-like carbon-nitrogen layer in sequence, wherein the soft-hard alternate transition layer repeatedly alternates by taking one layer of Ti film and one layer of TiN film as one cycle; one layer of Ti film is arranged on the metal matrix; one layer of TiN film is arranged below the fullerene-like carbon-nitrogen layer. The film has the advantages of high hardness, high toughness, high binding force, good deformation capability of the film and the matrix and excellent wear resistance, thereby improving the binding force of a film matrix and wear resistance of the matrix as well as prolonging the life of the matrix. According to the preparation method disclosed by the invention, the soft-hard alternate transition layer is prepared by a direct current pulse magnetron sputtering method; internal stress is reduced and crack propagation is stopped; the method is simple and easy to control.

Description

technical field [0001] The invention relates to a strong and tough integrated fullerene-like carbon-nitrogen multilayer composite film and a preparation method thereof, belonging to the technical field of surface engineering. Background technique [0002] Fullerene-like carbon-nitride (FL-CNx) films have high hardness, high elastic restitution coefficient, good toughness and excellent tribological properties, and have broad application prospects in space mobile parts. However, the preparation of fullerene-like films with high hardness and high elastic modulus tends to cause peeling failure of the film on metal substrates with relatively low hardness and elastic modulus. A large number of research results at home and abroad show that the important reason for the failure of the film is the large residual stress and the poor bonding force between the film and the substrate, which leads to the peeling off of the film and the substrate. Therefore, it is an urgent problem to prep...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/02C23C14/06C23C14/16
CPCC23C14/0036C23C14/022C23C14/0641C23C14/0658C23C14/165C23C14/35
Inventor 冯兴国周晖郑军万志华张延帅胡汉军
Owner LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
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