Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photocatalytic thin film on foam metal-graphene composite substrate and preparation method

A graphene composite, photocatalytic thin film technology, applied in catalyst activation/preparation, chemical instruments and methods, non-metallic elements, etc., can solve the problems of low solid solution photocatalytic efficiency, low Zn content, and large powder particle size.

Inactive Publication Date: 2018-02-02
秦永泽
View PDF8 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are some problems in this preparation method: First, due to the volatilization of Zn during the long-term high-temperature solid-state sintering process, the Zn content is low (1-xx Zn 1-x N x o 1-x The band gap of the solid solution is too large, which is not conducive to the absorption and utilization of visible light; secondly, the prepared Ga x Zn 1-x N x o 1-x Solid solution powder agglomeration is serious, the powder particle size is large, the size distribution is wide, and the specific surface area is very low. x Zn 1-x N x o 1-x The photocatalytic efficiency of solid solution is low; finally, since the catalyst is in powder form, it is difficult to recycle the powder during water catalysis, resulting in waste of catalyst
Chinese invention patent CN102389828A spin-coated highly dispersed layered double hydroxides (LDHs) on the substrate, and prepared highly dispersed Ga x Zn 1-x N x o 1-x solid solution film, but since the method uses ZnCl 2 , GaCl 3 and ZnSO 4 Metal salts such as Cl and S will inevitably cause impurity pollution problems such as Cl and S in the film
Chinese patent CN104878426A adopts electrochemical method to prepare Zn(OH) 2 , Ga(OH) 3 Composite layer, and then prepared Ga x Zn 1-x N x o 1-x Flexible photoanode, this method also has the problem of contamination by impurities such as Cl and S
[0005] Therefore, how to prepare Ga with large specific surface area, wide range controllable composition and high crystal quality x Zn 1-x N x o 1-x Nanocrystalline materials present great challenges

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photocatalytic thin film on foam metal-graphene composite substrate and preparation method
  • Photocatalytic thin film on foam metal-graphene composite substrate and preparation method
  • Photocatalytic thin film on foam metal-graphene composite substrate and preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Embodiment 1, as attached figure 1 , as shown in 2, 3.

[0036] A preparation of "p-type g-C 3 N 4 / n-type Ga 0.5 Zn 0.5 N 0.5 o 0.5 "The continuous process steps of the heterogeneous PN junction visible light photocatalytic film are:

[0037] a. ECR-PEMOCVD nitriding treatment of foamed nickel-graphene composite substrate: select a commercially available foamed nickel-graphene composite substrate with a length and width of 20 mm × 20 mm, a thickness of 2 mm, a pore diameter of 50 μm, and a porosity > 97%. Substrate, this composite substrate is to be loaded with graphene layer on the framework and inner wall of nickel foam substrate, and the average thickness of graphene layer is 0.67nm; Foam nickel-graphene composite substrate, from the glove of ECR-PEMOCVD equipment The box is delivered to the sample loading room, and then from the sample loading room to the material platform 24 in the vacuum reaction chamber 15. When the background pressure of the vacuum react...

Embodiment 2

[0048] Embodiment 2, as attached figure 1 , as shown in 2, 3.

[0049] Step a-step e in embodiment 2 is exactly the same as embodiment 1, difference is: in step b and step c, ammonia flow control is 15 sccm, oxygen flow control is 18 sccm, the molar flow control of trimethylgallium TMGa 2.8×10 - 6 mol / min, the molar flow control of diethyl zinc DEZn is 7.7×10 -6 mol / min.

[0050] Using the above steps, the "p-type g-C 3 N 4 / n-type Ga 0.3 Zn 0.7 N 0.3 o 0.7 "Heterogeneous PN junction visible light photocatalytic film. Among them Ga 0.3 Zn 0.7 N 0.3 o 0.7 The thickness of the buffer layer is 20nm; n-type Ga 0.3 Zn 0.7 N 0.3 o 0.7 The layer is a columnar nanocrystalline film with c-axis preferred orientation, the film thickness is 120nm, and the silicon doping concentration is 3×10 18 cm -3 , n-type Ga 0.3 Zn 0.7 N 0.3 o 0.7 The average lateral grain size of the nanocrystals in the layer is 25.3 nm; the p-type g-C 3 N 4 The thickness of the layer is 19.5...

Embodiment 3

[0052] Embodiment 3, as attached figure 1 , as shown in 2, 3.

[0053] Step a-step e in embodiment 3 is exactly the same as embodiment 1, difference is: what step a selects for use is the commercially available length and width dimension is 20mm * 20mm, thickness is 2mm, aperture is 50 μ m, porosity > 97% Foam silver-graphene composite substrate, this composite substrate is loaded with graphene layer on the skeleton and inner wall of foam silver substrate, and the average thickness of graphene layer is 0.67nm; And in step b and step c, ammonia gas The flow control is 15 sccm, the oxygen flow control is 18 sccm, and the molar flow control of trimethylgallium TMGa is 2.8×10 -6 mol / min, the molar flow control of diethyl zinc DEZn is 7.7×10 -6 mol / min.

[0054] Using the above steps, the "p-type g-C 3 N 4 / n-type Ga 0.3 Zn 0.7 N 0.3 o 0.7 "Heterogeneous PN junction visible light photocatalytic film. Among them Ga 0.3 Zn 0.7 N 0.3 o 0.7 The thickness of the buffer laye...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of photocatalytic thin film manufacturing, and provides a photocatalytic thin film on a foam metal-graphene composite substrate and a preparation method. Concretely, the preparation method comprises the steps of taking a foam metal-graphene composite material as a substrate, firstly using an electron cyclotron resonance-plasma enhancing metal organic matter CVD (chemical vapor deposition) method to successively perform nitrogen treatment of the foam metal-graphene composite substrate, preparation of a GaxZnl-xNxO1-x buffer layer and preparation of an n-type GaxZn1-xNxO1-x layer, then using a thermal polymerization method to prepare a p-type g-C3N4 layer, and finally using a magnetron sputtering method to prepare a precious metal nanometer granular layer. The prepared photocatalytic thin film has a very good visible light photocatalysis effect, can be used for photolyzing water to produce hydrogen, degrading organic pollutant in waste water,removing harmful gas and purifying air, and has a broad application prospect.

Description

technical field [0001] The invention belongs to the technical field of photocatalytic thin film manufacturing, and particularly relates to a photocatalytic thin film on a foamed metal-graphene composite substrate and a preparation method thereof. Specifically, the foamed metal-graphene composite material is used as a substrate, and electron cyclotron resonance is used first. -Plasma-enhanced metal-organic chemical vapor deposition (ECR-PEMOCVD) method sequentially nitridizes metal foam-graphene composite substrates and prepares Ga x Zn 1-x N x o 1-x buffer layer and preparation of n-type Ga x Zn 1-x N x o 1-x layer, followed by the preparation of p-type g-C using a thermal polymerization method 3 N 4 layer, and finally a noble metal nanoparticle layer was prepared using the magnetron sputtering method. Background technique [0002] Photocatalytic technology can use sunlight to drive some important chemical reactions, such as photolysis of water to produce hydrogen, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B01J27/24B01J37/34C01B3/04
CPCC01B3/042B01J27/24B01J37/341B01J37/342B01J35/393B01J35/23B01J35/59B01J35/39Y02E60/36
Inventor 秦永泽
Owner 秦永泽
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com