Device system for treating chlorosilane slag slurry raffinate
A chlorosilane, slurry technology, applied in the directions of halosilane, silicon, chlorine/hydrogen chloride, etc., can solve the problem of no reports of metal and copper recovery, and achieve cost reduction and environmental protection pressure, convenient recovery, reduction of lye and other problems. The effect of water resources
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0090] The chlorosilane slurry raffinate treated here is taken from a cold hydrogenation unit in a certain polysilicon production, and its main components are shown in Table 1:
[0091] Table 1 Composition of slurry raffinate
[0092] main ingredient
Mass fraction (wt)%
83.31%
0.13%
3.85%
Dichlorodihydrosilane
0.13%
Other metal chlorides
3.56%
Phosphorus trichloride
2.31%
Methyldichlorosilane
0.01%
0.00%
3.18%
1.54%
[0093] Get 10000g of chlorosilane slag residue and transport it to the preliminary recovery device I as shown in the accompanying drawing. After standing for a period of time, the solids are settled at the bottom of the container, and the upper layer is a chlorosilane solution with a lower solid content. After the upper layer solution is separated, its ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com