Spinel type Col-xMnxFe2O4 ferromagnetic film and preparation method thereof
A co1-xmnxfe2o4, ferromagnetic thin film technology, applied in the field of spinel type Co1-xMnxFe2O4 ferromagnetic thin film and its preparation, to achieve the effect of good system uniformity, easy control, and precise and controllable chemical composition
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0030] Step 1: Dissolve cobalt nitrate, manganese acetate and iron nitrate in a molar ratio of 0.9:0.1:2 in ethylene glycol methyl ether (x=0.1), stir for 30 minutes, then add acetic anhydride to obtain a Fe ion concentration of 0.3 mol / L stable Co 0.9 mn 0.1 Fe 2 o 4 Precursor, Co 0.9 mn 0.1 Fe 2 o 4 The volume ratio of ethylene glycol methyl ether and acetic anhydride in the precursor solution is 3.5:1;
[0031] Step 2: Place the Si substrate in detergent, acetone, and ethanol in sequence for ultrasonic cleaning, rinse the FTO / glass substrate with a large amount of distilled water after each ultrasonic cleaning for 10 minutes, and finally dry it with nitrogen. Then put the Si substrate into an oven to bake until dry, take it out and let it stand at room temperature. Then place the clean Si substrate in an ultraviolet light irradiator for 40 minutes to make the surface of the Si substrate reach "atomic cleanliness". Spin-coating Co on Si substrates by spin-coating 0...
Embodiment 2
[0035] Step 1: Dissolve cobalt nitrate, manganese acetate and iron nitrate in a molar ratio of 0.8:0.2:2 in ethylene glycol methyl ether (x=0.2), stir for 30 minutes, and then add acetic anhydride to obtain a Fe ion concentration of 0.35 mol / L stable Co 0.8 mn 0.2 Fe 2 o 4 Precursor, Co 0.8 mn 0.2 Fe 2 o 4 The volume ratio of ethylene glycol methyl ether and acetic anhydride in the precursor solution is 4.5:1;
[0036] Step 2: Incorporate the SrTiO 3 The single crystal substrate was ultrasonically cleaned in detergent, acetone, and ethanol in sequence, and the SrTiO was rinsed with a large amount of distilled water after ultrasonic cleaning for 10 minutes each time. 3 Single crystal substrates were finally blown dry with nitrogen. Then the SrTiO 3 The single crystal substrate is baked in an oven until dry, then taken out and allowed to stand at room temperature. Then the clean SrTiO 3 The single crystal substrate was irradiated for 40min in a UV irradiation instrum...
Embodiment 3
[0040] Step 1: Dissolve cobalt nitrate, manganese acetate and iron nitrate in a molar ratio of 0.7:0.3:2 in ethylene glycol methyl ether (x=0.3), stir for 50 minutes, and then add acetic anhydride to obtain a Fe ion concentration of 0.4 mol / L stable Co 0.7 mn 0.3 Fe 2 o 4 Precursor, Co 0.7 mn 0.3 Fe 2 o 4 The volume ratio of ethylene glycol methyl ether and acetic anhydride in the precursor solution is 3.8:1;
[0041] Step 2: LaNiO 3 The single crystal substrate was ultrasonically cleaned in detergent, acetone, and ethanol in sequence, and after each ultrasonic cleaning was performed for 10 minutes, the LaNiO was rinsed with a large amount of distilled water. 3 Single crystal substrates were finally blown dry with nitrogen. Then LaNiO 3 The single crystal substrate is baked in an oven until dry, then taken out and allowed to stand at room temperature. Then the clean LaNiO 3 The single crystal substrate was irradiated for 40min in a UV irradiation instrument to make...
PUM
Property | Measurement | Unit |
---|---|---|
Saturation magnetization | aaaaa | aaaaa |
Residual magnetization | aaaaa | aaaaa |
Coercivity | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com