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Iron-doped silica sol composite abrasive grain, and polishing solution composition and preparation method thereof

A polishing liquid composition, a technology of silica sol, applied in polishing compositions containing abrasives, chemical instruments and methods, other chemical processes, etc., can solve the problem of low polishing rate, low production efficiency, surface quality to be further improved, etc. problem, to achieve the effect of increasing the polishing rate and increasing the removal rate

Inactive Publication Date: 2015-09-30
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The polishing effect of silicon oxide abrasive grains on sapphire is better, but there are some problems in the CMP polishing process, such as low polishing rate resulting in low production efficiency, and the surface quality needs to be further improved

Method used

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  • Iron-doped silica sol composite abrasive grain, and polishing solution composition and preparation method thereof
  • Iron-doped silica sol composite abrasive grain, and polishing solution composition and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] The iron-doped silica sol composite abrasive grains of the present invention can be prepared by a co-precipitation method. The preparation process is as follows: in the process of preparing the silica sol by the ion exchange method, the iron element is doped into the silica sol particles by co-precipitation. Pass the water glass with a mass fraction of 8.0% through the cation exchange resin, and receive the outflowing liquid when the pH value of the outflowing liquid is between 2.5-3.5, and then obtain a mass fraction of 2.0-3.0% active silicic acid solution; at 100°C and Under stirring, add 750 grams of ferric chloride solution with a mass fraction of 0.29% and 750 grams of an active silicic acid solution with a mass fraction of 2.0-3.0% into 3000 grams of a 10% seed crystal silica solution, and dropwise A sodium hydroxide solution with a mass fraction of 0.4% is used to control the dropping rate, to keep the liquid level of the silicon oxide seed crystal mother liquor...

Embodiment 2

[0033] 1500g of ferric chloride solution with a mass fraction of 0.29% and 1500g of a mass fraction of 2.0-3.0% active silicic acid solution are used. Finally, a polishing solution doped with iron element-doped silica sol composite abrasive grains with a mass ratio of 0.96% was obtained.

[0034] The doping mass ratio is 0.96% The composition and mass percentage of the iron-doped colloidal silicon oxide composite abrasive polishing fluid are as follows:

[0035] Iron-doped silica sol composite abrasive grains 6.06 wt.%

[0036] Dispersant sodium hexametaphosphate 2 wt.%

[0037] Deionized water 91.94 wt.%

Embodiment 3

[0039] Use 3000g of ferric chloride solution with a mass fraction of 0.29% and 3000g of a mass fraction of 2.0-3.0% active silicic acid solution to mix evenly. Finally, a polishing solution doped with iron element doped silica sol composite abrasive grains with a doping mass ratio of 1.91% was obtained.

[0040] The doping mass ratio is 1.91% The composition and mass percentage of the iron-doped colloidal silicon oxide composite abrasive polishing fluid are as follows:

[0041] Iron doped silica sol composite abrasive grains 6.12 wt.%

[0042] Dispersant sodium hexametaphosphate 2 wt.%

[0043] Deionized water 91.88 wt.%

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Abstract

The invention relates to an iron-doped silica sol composite abrasive grain, and a polishing solution composition and a preparation method thereof. The preparation method of the composite abrasive grain comprises the following steps: adding a 0.29 wt% ferric chloride solution and a 2-3 wt% dilute silicic acid solution in a mass ratio of 1:1 into a silica crystal seed under certain reaction conditions, and doping the iron element into the silica sol abrasive grain in the silica sol growth process to form the uniform stable iron-doped silica sol composite abrasive grain, wherein the doping mass percent is 0.1-5.0%. The physical structure of the composite abrasive grain is nano spherical. The chemical composition of the abrasive grain contains the iron element capable of performing chemical actions with the sapphire and silicon chip surface, thereby enhancing the polishing rate. When being used for polishing the sapphire substrate and silicon chip, the polishing solution provided by the invention can effectively lower the surface roughness and microroughness of the sapphire and silicon chip and enhance the polishing rate of the sapphire and silicon chip.

Description

technical field [0001] The invention relates to a polishing abrasive grain, a polishing liquid composition and a preparation method thereof, in particular to a preparation method of an iron-doped silica sol composite abrasive grain and the technical field of raw material surface grinding and polishing. Background technique [0002] Sapphire is widely used in electrical, optical and other fields due to its high Mohs hardness and good chemical stability. In the field of optoelectronics, light-emitting diodes (LEDs) have simple advantages such as low operating voltage, low power consumption, high efficiency, long life, solidification, fast response speed, and drive circuits, and are recognized as the most promising high-tech in the 21st century. one of the fields. Sapphire is used as a substrate material for LEDs because of its good high temperature stability and mechanical properties. The surface quality of sapphire has a very important impact on the performance and qua...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K3/14C09G1/02
Inventor 雷红顾倩陈入领马盼仝开宇黄丽琴张佰春
Owner SHANGHAI UNIV
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