Treatment system and treatment method of chlorosilane slurry raffinate
A treatment method and technology for a treatment system are applied in the field of treatment systems for chlorosilane slurry residues, and can solve problems such as increased discharge of slurry residues.
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[0042] The main device system and flow diagram used are as follows: figure 2 shown. Among them: F-01~F-04 are filter devices. T01 is a chlorosilane distillation unit; T-02 is a silicon tetrachloride distillation unit; T-03 is a dichlorodisilane distillation unit. R-01 is a chlorosilane waste gas and residual liquid hydrolysis device; R-02 is a metal chloride dissolving device; R-03 is a ammonia water deposition Fe 3+ and Al 3+ ions; R-04 is heated to discharge the ammonia gas in the ammoniacal copper ions, depositing Cu(OH) 2 ; R-05 is hydrochloric acid and Cu Cu(OH) 2 metathesis reactor. M-01 is a non-condensable gas mixer; M-02 is a raffinate mixer. DRYER-01 is a silicon powder drying device; DRYER-02 is a CuCl 2 Drying device; 1 is chlorosilane slurry residue; 2 is liquid chlorosilane mixture; 3 is silicon powder and metal chloride; 4 is crude silicon tetrachloride; 5 is crude hexachlorodisilane; 6 is refined hexachloroethyl Silane; 13 is refined silicon tetrachlor...
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