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Photosensitizer-free photoresist composition used in glass passivated rectifier chip (GPRC) technology

A photoresist and photosensitizer technology, which is applied in the direction of photosensitive materials used in opto-mechanical equipment, etc., can solve the problems of affecting the subsequent glass printing process, prone to bending and collapse, and unable to reduce the resistance to hydrofluoric acid and nitric acid etching solution.

Active Publication Date: 2015-05-27
SUZHOU RUIHONG ELECTRONIC CHEM CO LTD
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AI Technical Summary

Problems solved by technology

However, due to its softness, it is easy to bend and collapse when it is suspended in the air at 100um or more, which will affect the subsequent glass printing process and reduce the breakdown voltage and yield of the product.
[0014] What the present invention focuses on is that no photosensitizer is added to the cyclized rubber photoresist, and additives need to be added to improve its softness, but its ability to resist hydrofluoric acid nitric acid etching solution cannot be reduced.

Method used

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Embodiment Construction

[0024] In the photoresist that does not add photosensitizer in the present invention, the xylene solution of cyclization rubber, its preferred mass percentage is within 25~35%, preferred mass percentage content can obtain preferably viscosity and Film thickness conditions, mass percent lower than 25% or higher than 35%, are not suitable as photoresist compositions. Wherein, when the molecular weight of the cyclized rubber is 55±0.5 million and the cyclization rate is controlled at 62±1%, the photoresist has good corrosion resistance in the corrosive solution of hydrofluoric acid and nitric acid system.

[0025] Nano-scale 1,1,1-tris(4-hydroxyphenyl)ethane, as an additive of photoresist composition, its mass percentage is within 1~5%, and the compatibility with cyclized rubber is better, at the same time It is helpful to improve the flexibility of the photoresist layer. If the mass fraction is lower than 1%, the effect of improving flexibility cannot be achieved, and if it is ...

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PUM

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Abstract

The invention provides the use of a photosensitizer-free photoresist composition used in a glass passivated rectifier chip (GPRC) technology, wherein the photoresist composition is used in the GPRC technology, and a photosensitizer is saved, so that the production cost is lowered; the process sections such as exposure, development and post-baking are saved, so that the production time is shortened, the efficiency is increased, and the harm to the human body and the pollution to the environment which are caused by chemicals can be reduced; furthermore, the corrosion resistance of the photoresist composition in hydrofluoric acid and a nitric acid etching solution is maintained, so that the toughness of a photoresist layer is improved, and the exposed photoresist from a distance is not bended and does not collapse in corrosive liquid; therefore, the requirements of the production technology can be met, and the photosensitizer-free photoresist composition has very good market prospect.

Description

technical field [0001] The present invention relates to a kind of photoresist composition, especially relate to a kind of photoresist composition that does not contain photosensitizer in GPRC technology, but can improve photoresist tenacity at the same time. Background technique [0002] The rectifier diode is the most basic electronic component, which can convert the alternating current supplied by the power plant into the direct current used by the motor system and electronic circuit. Its function is very simple but also very important, ranging from household appliances to industrial equipment. The rectifier semiconductor plays an important role and is ubiquitous. Without it, electrical products will not work. It has been widely used in a variety of electrical appliances. However, since GE invented the GPR glass ball with excellent performance After the form of rectifier diodes, the technology of rectifier diode sheaths has not changed much for nearly 30 years. Until recen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004
Inventor 卞玉桂
Owner SUZHOU RUIHONG ELECTRONIC CHEM CO LTD
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