A kind of preparation method of visible light absorbing layer based on Ag3PO4 thin film

A technology of absorbing layer and visible light, applied in the field of photoelectric material preparation and photocatalysis, can solve the problems of difficult recovery of base photocatalyst, difficult photoelectric energy conversion, etc., and achieve the effect of low cost, easy thickness control and good adhesion.

Inactive Publication Date: 2016-07-06
CHINA UNIV OF MINING & TECH
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  • Description
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Problems solved by technology

[0005] The purpose of the present invention is to provide a 3 PO 4 The preparation method of the visible light absorbing layer of thin film, solves the present Ag 3 PO 4 Based photocatalysts are not easy to recycle, and it is not easy to realize photoelectric energy conversion and hydrogen production by photolysis of water

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  • A kind of preparation method of visible light absorbing layer based on Ag3PO4 thin film
  • A kind of preparation method of visible light absorbing layer based on Ag3PO4 thin film
  • A kind of preparation method of visible light absorbing layer based on Ag3PO4 thin film

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preparation example Construction

[0018] The preparation method of the visible light absorption layer is: the four-step process of "co-precipitation-spin coating-drying-sintering" is used. Steps: 1) Co-precipitation method is used to obtain Ag 3 PO 4 Nano powder, the size of the powder is in the range of 20~500nm; 2) Ag 3 PO 4 The powder is dissolved and dispersed in a transparent organic carrier to obtain a precursor sol, and then the obtained precursor sol is spin-coated on the substrate by a spin coating method to obtain a prefabricated Ag 3 PO 4 Thin film; 3) prefabricated Ag 3 PO 4 The film is dried in an oven at 20-80℃; 4), the dried Ag 3 PO 4 The prefabricated film is sintered in a muffle furnace to remove organic solvent residues.

[0019] The transparent organic carrier is composed of terpineol and ethyl cellulose, and their mass ratio is 10:1 to 5:1.

[0020] Ethyl cellulose and Ag in the precursor sol 3 PO 4 The mass ratio of the powder is 0.03:1 to 0.1:1.

[0021] The heat preservation stage of the sinteri...

Embodiment 1

[0022] Example 1: Using fluorine tin oxide (FTO) conductive glass as a substrate, 0.4g of ethyl cellulose was added to 5mL of terpineol and stirred at room temperature for 24 hours to obtain a transparent viscous liquid, which was prepared by taking 0.5g of co-precipitation method Ag 3 PO 4 Grind for 30 min, add to 375 μL of the above transparent viscous liquid, and stir for 2 h to obtain a gel. Place the FTO conductive glass on the homogenizer, drop the gel in the center, spin-coating at a low speed of 1000r / min for 10s, and then spin-coating at a high speed of 3000r / min for 60s to obtain a film. The spin-coated film was dried in an oven at 60°C for 12 hours, and then placed in a muffle furnace for sintering. Raise the temperature from room temperature to 125°C at a rate of 1°C / min, hold for 30 minutes, then heat up to 400°C at a rate of 10°C / min, hold for 90 minutes, and cool to room temperature naturally to obtain a stronger film. Will be prepared Ag 3 PO 4 The base film is...

Embodiment 2

[0023] Example 2: Using indium tin oxide (ITO) conductive glass as a substrate, 0.4 g of ethyl cellulose was added to 4.5 mL of terpineol and stirred at 60°C for 12 hours to obtain a transparent viscous liquid. Take 0.4 g of Ag 3 PO 4 Grind for 30min, add to 225μL of the above transparent viscous liquid, stir for 2h to obtain a gel. The film was obtained by knife coating, dried in an oven at 50°C for 12 hours, and then placed in a muffle furnace for sintering. Raise the temperature from room temperature to 125°C at a rate of 1°C / min, hold for 30 minutes, then heat up to 375°C at a rate of 10°C / min, hold for 90 minutes, and cool to room temperature naturally to obtain a stronger film. Will be prepared Ag 3 PO 4 The base film photoanode is used in the electrochemical workstation, the Pt electrode is used as the counter electrode, the calomel electrode is used as the reference electrode, and the 0.1M potassium nitrate aqueous solution is used as the electrolyte.

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Abstract

The invention discloses a preparation method of a visible light absorption layer based on an Ag3PO4 film, and belongs to a preparation method of photocatalysis and photoelectric materials. The visible light absorption layer is prepared by using a four-step process including coprecipitation, spin coating, drying and sintering, and the method comprises the steps of 1) preparing Ag3PO4 nano-scale ultrafine powder of which the size scale is between 20 and 500 nm by using a coprecipitation method; 2) ultrasonically dispersing the Ag3PO4 powder into transparent organic solvents, and performing spin coating on the obtained sol shaped dispersion liquid on a substrate to obtain a prefabricated Ag3PO4 film layer; and 3) putting the prefabricated Ag3PO4 film layer into an oven at the temperature of 20-80 DEG C for drying, and putting into a muffle furnace for sintering and removing organic residues. The Ag3PO4 visible light absorption layer has a thickness of 0.2-10 microns, and is high in response characteristics and adhesive force of visible light; because the visible light absorption layer is used as a photocatalyst, the visible light absorption layer is easy to recover, can be used for a photo-anode of a photoelectrochemical cell, and has a large application potential on the fields of light degradation pollutants, photolysis of water, photovoltaic conversion and the like. The method is simple, free of toxicity, easy to operate and low in cost.

Description

Technical field [0001] The invention relates to a method for preparing photocatalytic and photoelectric materials, in particular to a method based on Ag 3 PO 4 Method for preparing visible light absorbing layer of thin film. Background technique [0002] Since the 1970s, environmental pollution and energy shortages have increasingly caused people to worry about the outbreak of global crises and even disasters. From the perspective of the sustainable development of human society, the development of green environmental pollution control technologies and alternative clean energy sources is urgent. Comparing all current technologies, it is found that semiconductor photocatalysis is a promising technology because it is easy to use the energy in natural light or artificial light sources. Photocatalytic materials are a type of semiconductor that can generate electrons and holes under the irradiation of light, and then can decompose water into hydrogen and oxygen, or decompose organic w...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J27/18H01G9/20H01G9/042
Inventor 顾修全张双强颖怀赵宇龙
Owner CHINA UNIV OF MINING & TECH
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