High-dielectric-constant Bi0.92Ho0.08Fe[1-x]MnxO3 ferroelectric film and preparation method thereof
A high dielectric constant, ferroelectric thin film technology, applied in chemical instruments and methods, iron compounds, inorganic chemistry, etc., can solve the problem that it is difficult to obtain saturated hysteresis loops and large remanent polarization, which hinders the application of materials, Narrow temperature range and other issues, to achieve the effect of improving multiferroic properties, reducing volatilization, and improving electrical properties
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Embodiment 1
[0038] Step 1: Select the FTO / glass substrate as the substrate, and place the cut FTO / glass substrate in detergent, acetone and ethanol in order for ultrasonic cleaning. After each ultrasonic cleaning for 10 minutes, rinse the substrate with a large amount of distilled water, and finally use nitrogen. Blow dry. Then put the FTO / glass substrate into a 70°C oven and bake for 5 minutes, take it out and let it stand to room temperature. Finally, the FTO / glass substrate is placed in an ultraviolet irradiator for 40 minutes to make the surface of the substrate achieve "atomic cleanliness".
[0039] Step 2: The massage ratio is 0.97:0.99:0.08:0.01 (ie x=0.01) and Bi(NO 3 ) 3 ·5H 2 O, Fe(NO 3 ) 3 ·9H 2 O, Ho(NO 3 ) 3 ·6H 2 O and C 4 H 6 MnO 4 ·4H 2 O is dissolved in the mixed solution, and after 2.5 hours of magnetic stirring, a uniform and stable precursor solution is obtained. The mixed solution is a mixture of ethylene glycol methyl ether and acetic anhydride in a volume ratio of 3:1....
Embodiment 2
[0044] Step 1: Select the FTO / glass substrate as the substrate, and place the cut FTO / glass substrate in detergent, acetone and ethanol in order for ultrasonic cleaning. After each ultrasonic cleaning for 10 minutes, rinse the substrate with a large amount of distilled water, and finally use nitrogen. Blow dry. Then put the FTO / glass substrate into a 70°C oven and bake for 5 minutes, take it out and let it stand to room temperature. Finally, the FTO / glass substrate is placed in an ultraviolet irradiator for 40 minutes to make the surface of the substrate achieve "atomic cleanliness".
[0045] Step 2: The massage ratio is 0.97:0.98:0.08:0.02 (ie x=0.02) and Bi(NO 3 ) 3 ·5H 2 O, Fe(NO 3 ) 3 ·9H 2 O, Ho(NO 3 ) 3 ·6H 2 O and C 4 H 6 MnO 4 ·4H 2 O is dissolved in the mixed solution, and after 2.5 hours of magnetic stirring, a uniform and stable precursor solution is obtained. The mixed solution is a mixture of ethylene glycol methyl ether and acetic anhydride in a volume ratio of 3:1....
Embodiment 3
[0050] Step 1: Select the FTO / glass substrate as the substrate, and place the cut FTO / glass substrate in detergent, acetone and ethanol in order for ultrasonic cleaning. After each ultrasonic cleaning for 10 minutes, rinse the substrate with a large amount of distilled water, and finally use nitrogen. Blow dry. Then put the FTO / glass substrate into a 70°C oven and bake for 5 minutes, take it out and let it stand to room temperature. Finally, the FTO / glass substrate is placed in an ultraviolet irradiator for 40 minutes to make the surface of the substrate achieve "atomic cleanliness".
[0051] Step 2: The massage ratio is 0.97:0.97:0.08:0.03 (ie x=0.03) and Bi(NO 3 ) 3 ·5H 2 O, Fe(NO 3 ) 3 ·9H 2 O, Ho(NO 3 ) 3 ·6H 2 O and C 4 H 6 MnO 4 ·4H 2 O is dissolved in the mixed solution, and after 2.5 hours of magnetic stirring, a uniform and stable precursor solution is obtained. The mixed solution is a mixture of ethylene glycol methyl ether and acetic anhydride in a volume ratio of 3:1....
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