Method for carrying out surface modification upon biodegradable magnesium and magnesium alloy through iron ion implantation deposition
A biodegradation and ion implantation technology is applied in the field of surface modification of biodegradable magnesium and magnesium alloys by iron ion implantation and deposition. Mechanical properties, improved biocompatibility, and improved corrosion resistance
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Embodiment 1
[0039] The first step: substrate pretreatment:
[0040] After the biomedical pure magnesium matrix is ground and polished, it is ultrasonically cleaned with acetone and absolute ethanol for 10 minutes to prepare the matrix sample;
[0041] The second step: ion implantation to prepare oxide transition layer:
[0042] (A) Put the substrate sample prepared in the first step into an ion implanter for argon ion sputtering to remove surface impurities; wherein, the vacuum degree is 0.1×10 -3 Pa, energy 5KeV, time 10min;
[0043] (B) Doping the matrix sample treated with argon ions with iron element to prepare a sample with a transition layer;
[0044] The ion implanter selects the target as an iron target, and the parameters required for doping iron elements: vacuum degree 0.1×10 -3 Pa, iron dose 1×10 16 ions / cm 2 , voltage energy 40KeV, current 1mA;
[0045] The third step: Ion beam enhanced deposition technology to prepare the surface iron thin film:
[0046] When deposit...
Embodiment 2
[0060] The first step: substrate pretreatment:
[0061] The bioactive magnesium alloy Mg-X (X=any one of Zn, Zr, Sr, Ca) matrix is ground and polished, and then ultrasonically cleaned with acetone and absolute ethanol for 10 minutes to prepare the matrix sample;
[0062] The second step: ion implantation to prepare oxide transition layer:
[0063] (A) Put the substrate sample prepared in the first step into an ion implanter for argon ion sputtering to remove surface impurities; wherein, the vacuum degree is 0.2×10 -3 Pa, energy 7KeV, time 10min;
[0064] (B) Doping the matrix sample treated with argon ions with iron element to prepare a sample with a transition layer;
[0065] The ion implanter selects the target as an iron target, and the parameters required for doping iron elements: vacuum degree 1.5×10 -3 Pa, dose of iron element 5×10 16 ions / cm 2 , voltage energy 65KeV, current 2mA;
[0066] The third step: Ion beam enhanced deposition technology to prepare the sur...
Embodiment 3
[0072] The first step: substrate pretreatment:
[0073] After the commercialized ZK60 and ZK61 magnesium alloy substrates were ground and polished, they were ultrasonically cleaned with acetone and absolute ethanol for 10 minutes to obtain substrate samples;
[0074] The second step: ion implantation to prepare oxide transition layer:
[0075] (A) Put the substrate sample prepared in the first step into an ion implanter for argon ion sputtering to remove surface impurities; wherein, the vacuum degree is 0.25×10 -3 Pa, energy 8KeV, time 20min;
[0076] (B) Doping the matrix sample treated with argon ions with iron element to prepare a sample with a transition layer;
[0077] The ion implanter selects the target as an iron target, and the parameters required for doping iron elements: vacuum degree 1.5×10 -3 Pa, iron dose 1×10 17 ions / cm 2 , voltage energy 75KeV, current 2.5mA;
[0078] The third step: Ion beam enhanced deposition technology to prepare the surface iron thin...
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