Preparation method of nano palladium oxide catalyst
A palladium oxide and nano-palladium technology, which is applied in the field of preparation of nano-palladium oxide catalysts, can solve the problems of affecting the use effect, large scale, uncontrollable shape, etc., and achieve consistent size, controllable shape, high specific surface energy and The effect of catalytic ability
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0020] This embodiment includes the following steps:
[0021] (1) Preparation of nano-palladium array and alumina composite structure: use a silicon wafer as a substrate, and magnetron sputtering a 50nm copper layer on the silicon wafer substrate, and then cover the copper layer with a porous alumina template as a cathode, using The metal platinum sheet is used as the anode and placed in the container; ammonia water, 0.03mol / L PdNO 3 and 0.09 mol / L potassium sodium tartrate as electrodeposition solution, , Adjust the amount of ammonia water so that the pH of the electrodeposition solution is 8.0, the electrodeposition temperature is 30°C, and the deposition current density is 2.5 A / dm 2 And the deposition time is 3.5 minutes; after the electrodeposition is completed, take out the silicon wafer substrate with the nano-palladium array and alumina composite structure from the container, and then remove the silicon wafer substrate to obtain the nano-palladium array and alumina co...
Embodiment 2
[0025] (1) Preparation of nano-palladium array and alumina composite structure: use a silicon wafer as a substrate, and magnetron sputtering a 50nm copper layer on the silicon wafer substrate, and then cover the copper layer with a porous alumina template as a cathode, using The metal platinum sheet is used as the anode and placed in a beaker; ammonia water, 0.03mol / L PdNO 3 , 0.09 mol / L potassium sodium tartrate was used as the electrodeposition solution, the pH of the electrodeposition solution was adjusted to 7.0 by adjusting the amount of ammonia water, the electrodeposition temperature was 30°C, and the deposition current density was 2.5 A / dm 2 And the deposition time is 1 min; after the electrodeposition is completed, take out the silicon wafer substrate with the nano-palladium array and alumina composite structure from the beaker, and then remove the silicon wafer substrate to obtain the nano-palladium array and alumina composite structure;
[0026] (2) Extraction of na...
Embodiment 3
[0029] This implementation includes the following steps:
[0030] (1) Preparation of nano-palladium array and alumina composite structure: use a silicon wafer as a substrate, and magnetron sputtering a 150nm copper layer on the silicon wafer substrate, and then cover the copper layer with a porous alumina template as a cathode, using The metal platinum sheet was used as the anode and put into a beaker; ammonia water, 0.02 mol / L palladium chloric acid and 0.01 mol / L potassium sodium tartrate were used as the electrodeposition solution, and the amount of ammonia water was adjusted so that the pH value of the electrodeposition solution was 9.0, and the electrodeposition temperature at 60°C, the deposition current density is 5A / dm 2 And the deposition time is 9 minutes; after the electrodeposition is completed, take out the silicon wafer substrate with the nano-palladium array and alumina composite structure from the beaker, and then remove the silicon wafer substrate to obtain th...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com