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Production method for high-compactness chromium alloy target

A production method, chromium alloy technology, applied in metal material coating technology, ion implantation plating, coating, etc., can solve the problems of lack of preparation technology, etc., and achieve simple and easy control of the process, low production cost, and uniform density Effect

Active Publication Date: 2013-03-20
烟台希尔德材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for the preparation of large-scale high-density chromium alloy targets, there is still a lack of mature and stable preparation processes

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] This example provides a method for producing a chromium-nickel alloy target, which includes the following steps in sequence:

[0039] (I), vacuum degassing

[0040] Use -200 mesh, purity of 99.95wt%, oxygen content (718ppm) chromium powder and nickel powder (requires -200 mesh, purity greater than 99.9%, oxygen content of 690ppm) as raw materials, the weight ratio of chromium powder and nickel powder 4:1, mix evenly, first pressurize 5MPa to ensure that the powder will not overflow a lot during the vacuuming process, and keep the vacuum at 10 -3 Under the environment of Pa, raise the temperature to 700°C at a rate of 200°C / h, keep it warm for 1 hour, and fill it with argon;

[0041] (Ⅱ), step-by-step temperature increase and pressure increase

[0042]In order to ensure that the flow and bonding of chromium materials are carried out in an orderly manner during the high-temperature sintering process, the hot-pressing process adopts a multi-stage temperature increase and...

Embodiment 2

[0057] This example provides a method for producing a nickel-chromium-silicon alloy target, which includes the following steps in sequence:

[0058] (I), vacuum degassing

[0059] Use -200 mesh, 99.95wt% purity, 718ppm oxygen content chromium powder, nickel powder (require -200 mesh, purity greater than 99.9%, oxygen content 690ppm) and silicon powder (require -200 mesh, purity greater than 99.99%, Oxygen content is 800ppm) as the raw material, the weight ratio of chromium powder, nickel powder and silicon powder is 45:30:25. keep it at 10 -3 Under the environment of 300°C / h, the temperature was raised to 700°C, kept for 1 hour, and filled with argon.

[0060] (Ⅱ), step-by-step temperature increase and pressure increase

[0061] Pressurize to 10MPa, then heat to 1100°C at a heating rate of 200°C / h, and keep warm for 1 hour to ensure uniform temperature distribution in the mold cavity. Finally, heat up to 1400°C at a heating rate of 100°C / h, hold for 1 hour, start from 1100...

Embodiment 3

[0076] This example provides a method for producing a chromium-titanium alloy target, which includes the following steps in sequence:

[0077] (I), vacuum degassing

[0078] Use -200 mesh, purity of 99.95wt%, chromium powder and titanium powder with oxygen content of 718ppm (requires -200 mesh, purity greater than 99.9%, oxygen content of 990ppm) as raw materials, and the weight ratio of chromium powder and titanium powder is 9:1, mix evenly, pressurize 5MPa first to ensure that the powder will not overflow a lot during the vacuuming process, and keep the vacuum at 10 -3 Under the environment of 300°C / h, the temperature was raised to 650°C, kept for 1 hour, and filled with argon.

[0079] (Ⅱ), step-by-step temperature increase and pressure increase

[0080] In order to ensure that the flow and bonding of chromium materials are carried out in an orderly manner during the high-temperature sintering process, the hot-pressing process adopts a multi-stage temperature increase and...

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PUM

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Abstract

The invention relates to a production method for a high-compactness chromium alloy target, comprising the steps of vacuum degassing, periodic heating and pressurizing, pressure maintaining and furnace cooling, hot forging, annealing, hot rolling, annealing and machining which are sequentially performed, wherein chromium powder having a density of -200 meshes, a purity of greater than 99.95 wt% and an oxygen content of less than 1000 ppm, and an alloy metal powder are used as raw materials. Via the production method disclosed by the invention, the high-compactness chromium alloy target having uniform ingredients and density, a grain size of less than 100 microns, a purity of greater than 99.9%, a relative density of greater than 99% and an oxygen content of less than 1000 ppm can be successfully obtained. Additionally, the method disclosed by the invention is low in production cost, and the technical process is simple and easy to control.

Description

technical field [0001] The invention belongs to the technical field of new materials, and in particular relates to a production method of a chromium alloy target. Background technique [0002] Metal chrome (Cr) is a slightly bluish silvery-white metal. Chromium has a strong passivation ability in the atmosphere and can maintain luster for a long time. Chromium has good corrosion resistance to various acids and strong alkalis, and has good chemical stability. Chromium also has the characteristics of high hardness and high resistivity. Due to the various properties of chromium, chromium and its alloys or compound films prepared by various surface technologies are widely used in surface engineering, such as: mechanical functional film, microelectronic film, electromagnetic functional film, optical film, decorative function membrane etc. With the development of high-tech, high-purity chromium alloy sputtering targets with different performance and requirements need to be used...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/14C22F1/18C22C1/04C22C27/06
Inventor 钟小亮王广欣王树森
Owner 烟台希尔德材料科技有限公司
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