Method for preparing bismuth titanate as visible light response semiconductor photochemical catalyst

A bismuth vanadate catalyst and semiconductor technology, applied in chemical instruments and methods, physical/chemical process catalysts, metal/metal oxide/metal hydroxide catalysts, etc., can solve the problem of small microwave generators and long hydrothermal treatment time , limited product output and other issues, to achieve the effects of short reaction time, easy industrial production, and simple production methods

Inactive Publication Date: 2011-02-16
南通宏洋化工有限公司 +1
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Problems solved by technology

[0008] Chinese patent document CN 101318700A (application number 200810048418.4) discloses a bismuth vanadate powder and its preparation method, using a hydrothermal method: cetyltrimethylammonium bromide is added during the synthesis of bismuth vanadate, The precursor of bismuth vanadate is put into a reaction kettle, hydrothermally treated at 80-200°C for 70-75 hours, and bismuth vanadate powder with microspherical and/or micro-flaky particles is obtained after subsequent separation, washing and drying. The prepared bismuth vanadate has high photocatalytic oxygen production activity, but the above hydrothermal treatment method requires a hydrothermal reactor, and the hydrothermal treatmen

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  • Method for preparing bismuth titanate as visible light response semiconductor photochemical catalyst
  • Method for preparing bismuth titanate as visible light response semiconductor photochemical catalyst
  • Method for preparing bismuth titanate as visible light response semiconductor photochemical catalyst

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Experimental program
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Embodiment 1）

[0035] The BiVO of this example 4 The preparation method comprises the following steps:

[0036] ① Prepare the liquid containing trivalent bismuth: accurately weigh 5.0084g (0.0103mol) Bi(NO 3 ) 3 ·5H 2 O was added to a beaker containing 50 mL of deionized water, and then 5 mL of 65% concentrated nitric acid was added to the beaker, and the Bi(NO 3 ) 3 ·5H 2 O dissolves completely, obtains colorless transparent solution, then adds the benzene of 3mL as auxiliary agent, obtains benzene as upper layer, Bi(NO 3 ) 3 The aqueous solution of the lower layer contains Bi(NO 3 ) 3 of liquid.

[0037] ② Prepare liquid containing oxyvanadate containing pentavalent vanadium: accurately weigh 1.2078g (0.0103mol) NH 4 VO 3 Add the powder into a beaker filled with 50mL deionized water, place the beaker on a heating furnace and heat it to 74°C to make NH 4 VO 3 Dissolve completely to obtain a reddish-brown solution, then remove the beaker from the heating furnace, add 3mL of benz...

Embodiment 2）

[0045] The BiVO of this example 4 The preparation method all the other are identical with embodiment 1, difference is:

[0046] In step 1., when configuring the liquid containing trivalent bismuth, the Bi(NO 3 ) 3 ·5H 2 O is 5.0526g (0.0104mol); the additives added under magnetic stirring are 2.5098g (0.0001mol) polyethylene glycol (molecular weight: 20000, analytically pure, Sinopharm Chemical Reagent Co., Ltd., the same below) and 3mL of benzene, continue to stir until polyethylene glycol is completely dissolved in water, so as to obtain benzene dissolved with part of polyethylene glycol as the upper layer, Bi(NO 3 ) 3 and the aqueous solution of polyethylene glycol as the lower layer containing Bi(NO 3 ) 3 of liquid.

[0047] In step ②, when configuring the liquid containing oxyvanadate containing pentavalent vanadium, NH 4 VO 3 Add to 50mL 84.5℃ hot water to make NH 4 VO 3 Dissolve completely to obtain a reddish-brown solution, then add 2.5073g (0.0001mol) polye...

Embodiment 3）

[0054] The BiVO of this example 4 The preparation method all the other are identical with embodiment 2, difference is:

[0055] In step ①, when configuring the liquid containing trivalent bismuth, Bi(NO 3 ) 3 ·5H 2 The amount of O used is 5.0170 g (0.0103 mol), and the amount of polyethylene glycol used is 10.0390 g (0.0005 mol).

[0056] In step ②, NH 4 VO 3 The dosage is 1.2099g (0.0103mol), so that NH 4 VO 3 The method of complete dissolution is to use a heating furnace to heat to 85 ° C, and then add 10.0014 g (0.0005 mol) of polyethylene glycol and 3 mL of benzene as additives in sequence.

[0057] In step ④, the primary product after washing is dried at 55°C, and the powder product BiVO obtained after drying 4 It is 3.0924g (0.0095mol), and the yield is 92.3%.

[0058] See Figure 7 with Figure 8 , The SEM spectrum of the finished product shows that the particles of the finished product are evenly distributed, spherical and accompanied by a few irregular smal...

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Abstract

The invention discloses a method for preparing bismuth titanate as a visible light response semiconductor photochemical catalyst, which comprises the steps of: dissolving bismuth salts in nitric acid at room temperature, dissolving vanadate or metavanadate same mol with the bismuth salts in 60-90 DEG C hot water, and respectively adding benzene or polyethylene glycol or a mixed solution of the benzene and the polyethylene glycol in two solutions obtained from the steps; and dropping vanadium-containing liquid into bismuth-containing liquid under the stirring state, stirring, ageing, filtering, washing and drying to prepare the bismuth titanate BiVO4 as a visible light response semiconductor photochemical catalyst. The BiVO4 prepared by the steps has the advantages of strong response of visual light, high photocatalytic oxidation degrading capability, simple preparation method, short reaction time and easy industrialized production.

Description

technical field [0001] The invention belongs to the technical field of inorganic materials and waste water treatment, and specifically relates to a preparation method of a visible light responsive semiconductor photocatalyst. Background technique [0002] With the development of modern industry, especially the organic chemical industry and printing and dyeing industry, the environmental pollution of human living has become increasingly prominent. For some high-concentration and refractory organic wastewater, it is difficult to achieve ideal results by using traditional chemical and biochemical treatment methods. Since 1972, Fujishima and Honda [Fujishima A, Honda K. Electrochemical photolysis of water at a semiconductor electrode [J]. Nature, 1972, 238: 37~38] in n-type semiconductor TiO 2 Since the photocatalytic decomposition of water to produce hydrogen on single crystal electrodes, the photocatalytic process has become one of the important research directions in the fie...

Claims

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Application Information

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IPC IPC(8): C02F101/30C02F1/30B01J23/22
CPCY02W10/37
Inventor 张春勇郑纯智张国华张纪霞赵兴红尚通明
Owner 南通宏洋化工有限公司
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