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Photosensitive resin composition

A technology of photosensitive resin and composition, which is applied in the field of photosensitive resin composition, can solve problems such as direct discharge, harmful hexavalent chromium ions, and lack of storage stability, and achieve the effect of improving preservation

Active Publication Date: 2010-09-15
村上化工(中山)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, after exposure and development of dichromate-type photosensitive resin, the developer solution contains hexavalent chromium ions, which are extremely harmful to the human body, and cannot be discharged directly.
However, as a multifunctional diazonium salt and water-soluble azide compound photosensitive resin, after adding an aqueous solution of a multifunctional diazonium salt and a water-soluble azide compound, the storage stability is lacking.

Method used

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Examples

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specific example

[0033] Specific examples of desirable component (A) in the present invention are as follows:

[0034] (1) Dichromates, such as: ammonium dichromate, potassium dichromate, sodium dichromate and other dichromates.

[0035] (2) Diazide compounds, such as:

[0036] 4,4'-diazidostilbene-2,2'-disulfonic acid (4,4'-diazidostilbene-2,2'-disulfonic acid), 4,4'-diazidostilbene-2 - Sulfonic acid (4,4'-diazidobenzalacetophenone-2-sulfonic acid), 4,4'-diazidostilbene-α-carboxylic acid (4,4'-diazidostilbene-α-carboxylic acid) and such compounds Alkali metal salts, ammonium salts, organic amine salts and other diazide compounds.

[0037] (3) Diazo resins, such as:

[0038] P-diazodiphenylamine or 4-diazo-3-methoxydiphenylamine and 4,4'-bis(methoxymethyl)bis Diazo resin of anion complex of sulfate, phosphate and zinc chloride double salt of polymer of phenyl ether (4,4'-bis-methoxymethyl-diphenyl ether);

[0039]Diazo resins of anionic complexes of sulfate, phosphate and zinc chloride do...

Embodiment 1

[0089]20 g of polyvinyl acetate with an average degree of polymerization of 1000 and an alcoholysis degree of 88% was heated and dissolved in 80 g of water and then cooled to room temperature. Add 8 g of a 10% aqueous solution of diazo resin (diphenylamine 4-diazonium salt and paraformaldehyde condensate) and 5 g of a 10% aqueous solution of 2,2,6,6-tetramethylpiperidinyloxy radical to prepare a photosensitive Resin composition.

[0090] Test the liquid stability and plate making test of the prepared photosensitive resin composition according to the following methods. The results obtained are recorded in Table 1.

[0091] Plate making test

[0092] Filter the prepared photosensitive resin composition with a 250-mesh polyester fiber mesh, and then use a stainless steel scraper to coat it on the screen plate of an aluminum mesh frame that has been stretched with a 300-mesh polyester mesh, and dry. Then, the coating and drying operations were repeated until the thickness of ...

Embodiment 2

[0097] 20 g of polyvinyl acetate with an average degree of polymerization of 1000 and an alcoholysis degree of 88% was dissolved in 80 g of water in the same manner as in Example 1. Then, while stirring, add 20 g of trimethylolpropane triacrylate in which 0.7 g of a mixture of 1-hydroxycyclohexyl benzophenone and benzophenone and 0.1 g of p-methoxyphenol have been dissolved as the photoinitiator of radical polymerization. and fully emulsified. In this emulsion, 9.6 g of a 10% aqueous solution of diazo resin (diphenylamine-4-diazonium salt and paraformaldehyde condensate) and 10% of 2,2,6,6-tetramethylpiperidinyloxy radical were added. An aqueous solution of 6.5 g was prepared as a photosensitive resin composition.

[0098] The prepared photosensitive resin composition was tested in the same manner as in Example 1, and the results obtained are recorded in Table 1.

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Abstract

The invention relates to a photosensitive resin composition. The composition comprises the following components: 0.001-1 part by weight of water-soluble light crosslinking agent, 1 part by weight of polyvinyl alcohol and 0.00001-0.5 part by weight of free radical trapping agent. The invention also relates to a photosensitive film or a screen printing plate made of the photosensitive resin composition. Compared with the prior art, the invention can enhance the preservability of the photosensitive resin composition after the water-soluble light crosslinking agent is added, and the preservability of the photosensitive film or the screen printing plate made of the photosensitive resin composition.

Description

technical field [0001] The present invention relates to a photosensitive resin composition, in particular to a photosensitive resin composition and a photosensitive film and a screen printing screen related matter made of the composition. Background technique [0002] Photosensitive resin compositions are widely used as raw materials for making stencils for photoengraving technology. (Reference: "Photopolymer technology" (Photopolymer technology) by Yafu Yamaoka, Gentaro Matsunaga, Nikkan Kogyo Shimbun (1998); "Photoreactive polymers" (Photoreactive polymers) by Arnost Reiser, John Wiley and Sons, New York, 1989.) Polymer photosensitive materials, in addition to excellent resolution, also have the characteristics of a wide range of exposures that can be selected according to the wavelength of light, and can be applied to various applications. In addition, the resin layer stencil formed by light irradiation can be used as an etching resist material when the substrate is etch...

Claims

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Application Information

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IPC IPC(8): G03F7/004G03F7/008G03F7/016G03F7/09
Inventor 山冈亚夫安达大作金田贞良高桥麻子望月信也长谷川桃
Owner 村上化工(中山)有限公司
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