Composite coating for abrasion-resistance and anti-corrosion treatments on surface of machine components and preparation method
A technology for mechanical parts and composite coatings, applied in coatings, chemical instruments and methods, metal material coating processes, etc., can solve problems such as easy failure, easy cracking, falling off, serious pollution, etc., to improve corrosion resistance , Improve the effect of density
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Embodiment 1
[0029] To replace the application of electrodeposited hard chromium plating in hydraulic rods, the following procedures are followed:
[0030] 1. After cleaning and drying the hydraulic rod with an ultrasonic cleaning device, place it on the workpiece rack in the unbalanced magnetron sputtering device;
[0031] 2. The vacuum system works so that the pressure in the vacuum chamber is 1×10 -3 Pa;
[0032] 3. Heat the hydraulic rod to 200°C and keep it warm for 0.5 hours, and use plasma cleaning to further clean the rod while keeping it warm;
[0033] 4. Introduce argon gas into the vacuum chamber, adjust the pressure of the vacuum chamber to 0.1-1Pa, use the unbalanced magnetron sputtering source, use Cr as the target material, and deposit a Cr film of 0.2 μm;
[0034] 5. Introduce nitrogen and argon into the vacuum chamber, keep the pressure of the vacuum chamber constant, use non-equilibrium magnetron sputtering, in Ar:N 2 CrN thin film of 6 μm is plated under the condition...
Embodiment 2
[0037] To replace the application of surface heat treatment technology in stamping dies, that is, punches, the operation is as follows:
[0038] 1. After cleaning and drying the punch with an ultrasonic cleaning device, place it on the workpiece rack in the unbalanced magnetron sputtering device;
[0039] 2. The vacuum system works and the pressure in the vacuum chamber is 1×10 -3 Pa;
[0040] 3. Heat the punch to 200°C and keep it warm for 0.5 hours, and use plasma cleaning to further clean the punch while keeping warm;
[0041] 4. Introduce argon gas into the vacuum chamber, adjust the pressure of the vacuum chamber to 0.1-1Pa, and deposit a Cr film of 0.1 μm by using an unbalanced magnetron sputtering source;
[0042] 5. Introduce nitrogen and argon into the vacuum chamber, keep the pressure of the vacuum chamber constant, use unbalanced magnetron sputtering, use Al and Cr targets, and use Ar:N 2 CrAlN thin film 4μm was deposited under the condition of volume flow ratio ...
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