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Quasi-molecule lamp apparatus

An excimer lamp and excimer technology, applied in the field of excimer lamp devices, can solve the problems of inert gas retention, rise and decrease of luminescent gas temperature, etc., and achieve the effect of easy shrinkage and ease of warping

Active Publication Date: 2010-06-16
USHIO DENKI KK
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, when the temperature of the light-emitting gas enclosed in the discharge vessel of the excimer lamp rises, the generation of excimers is hindered and the amount of light emitted decreases.
When the input power of the excimer lamp is increased, the temperature of the luminous gas inside will rise, so there is a problem that even if the input is increased to increase the illuminance, the luminous efficiency will decrease
In order to send out the gas with a fast flow rate without changing the total flow rate, it is necessary to reduce the diameter of the discharge port or reduce the number of discharge ports. Therefore, stagnation of inert gas will occur between the discharge ports formed on the gas supply pipe.
[0010] In addition, in order to improve the efficiency of substrate surface treatment, the inert gas must be continuously replaced in the lamp housing, and the method of installing nozzles for cooling under the lamp or on the side of the same height will hinder the replacement of the inert gas. Unable to adopt

Method used

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Embodiment Construction

[0036] figure 1 (a) and figure 1 (b) is a schematic configuration diagram of an example of the excimer lamp 20 provided in the excimer lamp device of the present invention, figure 1 (a) is a cross-sectional view along the length direction, figure 1 (b) is a cross-sectional view along the width direction.

[0037] Such as figure 2 As shown, the excimer lamp 20 is made of silica glass as a dielectric material, and has a flat square tube-shaped discharge vessel 24 with rounded four corners. The discharge space S formed inside the discharge vessel 24 is filled with, for example, a rare gas such as xenon gas or a gas mixed with a halogen gas such as chlorine gas as the discharge gas. Excimer light of different wavelengths is generated depending on the type of discharge gas. The discharge gas is usually filled with a pressure of about 10 to 100 KPa.

[0038]In the discharge vessel 24, a flat wall 25 on the upper side and a flat wall 26 on the lower side are separated from...

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PUM

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Abstract

The present invention provides a quasi-molecule lamp apparatus having improved surface treatment efficiency and light-emitting efficiency of vacuum ultraviolet lights. The quasi-molecule lamp apparatus comprises a lamp casing (10), a quasi-molecule lamp (20), air feeding tubes (12A) having air spraying outlets (12a) and a carrying and delivering mechanism (38). A plurality of air feeding tubes are positioned discretely in the lamp casing (10) of the quasi-molecule lamp apparatus (10) which irradiates quasi-molecule lights to an object to be processed, two adjacent air feeding tubes have at least a couple of air spraying outlets, wherein, one air spraying outlet in positioned on one of the air feeding tubes and the other air spraying outlet is positioned on the other air feeding tube, and the two one air spraying outlets are a couple, the spraying directions of the couple of air spraying outlets are opposing or intersected in the room (A) between the two adjacent air feeding tubes, and the quasi-molecule lamp is positioned vertically below the room (A).

Description

technical field [0001] The invention relates to an excimer lamp device. In particular, it relates to an excimer lamp device used for cleaning of a semiconductor substrate or a liquid crystal substrate in a manufacturing process of a semiconductor substrate or a liquid crystal substrate. Background technique [0002] In recent years, in the manufacturing process of semiconductor substrates or liquid crystal substrates, as a method of removing dirt such as organic compounds adhering to the surface of a wafer as a semiconductor substrate or a glass substrate as a liquid crystal substrate, ultraviolet light is widely used. Dry cleaning method. In particular, in the cleaning method by ozone or active oxygen using vacuum ultraviolet rays radiated from an excimer lamp, various cleaning devices that perform cleaning more efficiently and in a short time are proposed, for example, Patent Document 1 is known. [0003] Figure 14 It shows the same structure as the conventional excimer...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J65/00H01J61/35F21V29/02H01L21/304B08B5/02B08B7/00
CPCH01L21/67028
Inventor 远藤真一
Owner USHIO DENKI KK
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