Micro-porous membrane compounded multi-layer fluorine-containing cross-linking doped ionic membrane
A technology of doping ions and microporous membranes, applied in the field of functional polymer composite materials
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Embodiment 1
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[0102] , EW=1000 polymer resin, vanadium carbonate (accounting for 0.01% of resin mass), particle size is 0.005 μ m Zr (HPO 4 ) 2 (Zr(HPO 4 ) 2 The mass ratio with resin is 3: 100) be dispersed in propanol-water, make total mass concentration be 5% propanol-water solution, then add mass concentration and be the perfluoromalonyl peroxide DMF solution of 5%, will surface with H 3 PO 4 -SiO 2 The modified 30 μm thick expanded polytetrafluoroethylene film (porosity 70%) is placed in the above solution and soaked for about 1 hour, then the soaked film is dried on a heating plate, and the film is dried with a rubber roller. rolling. The above solution was cast into a polytetrafluoroethylene casting mold placed horizontally, and after vacuum drying at 80°C for 12 hours, the membrane was peeled off to obtain a doped ion membrane (single Layer film 1#). The above two single-layer ionic membranes 1# are stacked and hot-pressed ...
Embodiment 2
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[0106] , polymer resin with EW=800 and SiO with a particle size of 0.03 μm 2 (SiO 2 The mass ratio with perfluorosulfonic acid resin is 5: 100), and extruded to obtain a film with a thickness of 30 μm, which is then passed through the phosphorylated-silicon dioxide modified porous hexafluoropropylene membrane at 260 ℃ under vacuum state, heat press together, then heat in a vacuum oven at 150 ℃ for 1 hour, and then soak in NH 4 Cl in DMF for 5 hours. The soaked membrane was then placed in triethylamine at 200°C for 2 hours to obtain a crosslinked membrane. The membrane was sequentially treated with KOH solution and hydrochloric acid solution to obtain an ion exchange membrane (single-layer membrane 2#) with a cross-linked bridge structure (II).
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[0109] , EW=1200 polymer resin and tetraphenyl tin are extruded into a film with a thickness of 20 μm by a twin-screw extruder, ...
Embodiment 3
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[0113] , EW=1100 polymer resin, lanthanum acetate (lanthanum acetate accounts for 0.001% of resin mass) and Ce (HPO 4 ) 2 (resin and Ce(HPO 4 ) 2 The mass ratio is 100:1) to prepare a polymer resin solution with a total mass concentration of 3%, and sulfuric acid-ZrO 2 Modified porous Al 2 o 3 The film was immersed in the above solution, and after 30 minutes, the film was taken out and dried, and then the film was cross-linked by 50KGy radiation to obtain a cross-linked bridge structure with a thickness of 10 μm as (I) ionic film (single-layer film 4#).
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[0116] , polymer resin of EW=940, Ru-DMSO complex (accounting for 0.1% of resin quality) and H 3 PW 12 o 40 (polymer resin and H 3 PW 12 o 40 The mass ratio is 100:20) to prepare a DMSO solution with a total mass concentration of 30%, and process it at 170° C. for 60 minutes by casting method to obtain a film with...
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