Nanometer electronic device based on semiconductor nano materials and preparation method thereof
A technology of nanoelectronic devices and nanomaterials, applied in the field of nanoelectronic devices, can solve problems such as difficult large-scale application, difficult carbon nanotubes, poor wettability of metals and carbon nanotubes, etc., and achieves a simple and easy preparation method Effect
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Embodiment 1
[0026] Embodiment 1: A single-walled carbon nanotube field-effect transistor with a bottom-gate structure using yttrium (Y) as the source-drain electrode and its preparation
[0027] Such as figure 1 shown in SiO 2 It is a single-walled carbon nanotube field-effect transistor with a gate dielectric 4 and a back gate 5 structure using Si, and its source (S) 2 and drain (D) 3 electrode materials are yttrium (Y), which are located at the side of the single-walled carbon nanotube 1 ends. Concrete preparation steps are as follows:
[0028] 1) By positioning growth, or dropping the dispersed carbon tube solution onto the substrate, the Si / SiO 2 carbon nanotubes on a substrate;
[0029] 2) Observing with a scanning electron microscope or an atomic force microscope, and recording the specific position of the carbon nanotubes;
[0030] 3) Coating photoresist on the carbon nanotube and forming the shape of the electrode by optical exposure or electron beam lithography;
[0031] 4)...
Embodiment 2
[0036] Example 2: Carbon nanotube field effect transistor with Y as the top gate structure and its preparation
[0037] Such as Figure 4 In the carbon nanotube field effect transistor with Y as the top gate structure shown, the source (S) 8 and drain (D) 10 electrode materials are all yttrium (Y), and the electrode material of the gate (G) 6 is Ti. Walled carbon nanotubes 11 located in HfO 2 Under the gate dielectric layer 7, SiO 2 9 and Si12 on the substrate. Concrete preparation comprises the following steps:
[0038] 1) By positioning growth, or dropping the dispersed carbon tube solution onto the substrate to obtain the Si / SiO 2 carbon nanotubes on a substrate;
[0039] 2) Observing and recording the specific position of the carbon nanotubes through a scanning electron microscope or an atomic force microscope;
[0040] 3) Apply photoresist and form the shape of source and drain electrodes by optical exposure or electron beam lithography;
[0041] 4) Put the photoli...
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