Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Production method of plane continuous diffraction condensing lens

A concentrating lens and plane technology, which is applied in the field of plane continuous diffraction concentrating lens, can solve the problems of cumbersome process, low processing precision, and low diffraction efficiency, and achieve the goal of improving diffraction efficiency, improving manufacturing accuracy, and high product qualification rate Effect

Active Publication Date: 2009-07-01
NO 510 INST THE FIFTH RES INST OFCHINA AEROSPAE SCI & TECH
View PDF0 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the diffraction efficiency of the binary optical element is proportional to the number of steps, the more the number of steps, the higher the diffraction efficiency, and it also increases the number of mask making, and requires higher alignment accuracy
Therefore, it is difficult to make the diffraction efficiency of the binary optical element very high, the process is cumbersome, the yield is very low, and the cost is high
With the development of technology, people use diamond cutting method to process infrared continuous diffraction microstructure, but due to the low processing precision, the diffraction efficiency is also very low.
Later, a continuous diffractive microstructure was developed by using the mask moving exposure method. The production accuracy is relatively high, but the types of continuous microstructures are limited, and the process is difficult to control and cannot be popularized.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] 1. Fabrication of planar continuous diffractive condenser lens mask

[0015] Soak in a mixed solution of potassium dichromate and concentrated sulfuric acid for 3.5 hours; scrub and rinse with deionized water; then spin dry with a glue spinner, bake in a dryer at 80°C for 35 minutes, and finally cool at room temperature. Coat photoresist on the cleaned substrate surface, photoresist type S1860. The gluing adopts the rotary gluing method, and the gluing equipment adopts a rotary gluing machine, and the thickness of the glue can be adjusted by controlling the speed. The speed is 4000 rpm, and the thickness of the glue layer is 2 μm. The substrate coated with the photoresist layer is placed in a vacuum oven for pre-baking, the pre-baking temperature is 90° C., and the baking time is 40 minutes, and then the photoresist plate is obtained. According to the relationship between the design data of the lens mask (writing radius, writing depth) and the laser energy, write and c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for preparing a plane continuous diffractive focus lens, which comprises steps of manufacturing a mask of the plane continuous diffractive focus lens and utilizing a method of reactive ion beam etching to continuously transferring micro-structural patterns. The method utilizes the laser directing writing technique to carry out positional quantitative exposure to photoresist on the surface of a photoresist plate, after development, a continuous diffractive micro-structure is formed on the photoresist layer, then the mask is formed via heating and the like, and further the method utilizes the method of reactive ion beam etching to transfer the micro-structure on the surface of the mask to the surface of a substrate, thereby forming the plane continuous diffractive focus lens. The method has the advantages of high manufacturing precision, short manufacturing period, simple manufacturing process, low manufacturing cost and the like, and is suitable for manufacturing the lightweight and high-performance plane continuous diffractive focus lens. Compared with other manufacturing methods, the laser directing writing is the most advanced method, which can meet the manufacturing requirements of high-precision and high-performance continuous diffractive elements.

Description

technical field [0001] The invention relates to a continuous diffractive optical element, in particular to a method for manufacturing a plane continuous diffractive condensing lens. Background technique [0002] With the development of space technology, miniaturization, light weight, and high performance have gradually become one of the main directions of spacecraft development. The application of diffractive optical elements in optical systems is beneficial to reduce system volume, reduce weight, simplify optical systems and improve imaging quality. Therefore, diffractive optical elements have a good application prospect in the field of space remote sensing. Diffractive optical elements mainly rely on the diffraction microstructure on the lens surface to modulate the light amplitude or phase. The microstructure diffraction surface is usually a curved surface or a plane with a continuously changing phase. For a long time, due to the immaturity of manufacturing technology, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G02B27/42G03F7/00
Inventor 罗崇泰王多书刘宏开叶自煜熊玉卿陈焘马勉军
Owner NO 510 INST THE FIFTH RES INST OFCHINA AEROSPAE SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products