Coating agent for forming titanium/zirconium film, method for forming titanium/zirconium film and metal substrate coated with titanium/zirconium film

Abstract

The invention provides a titanium / zirconic containing coating agent for film-forming that contains a titanium / zirconic aqueous solution obtained by reaction of (A) titanium compound and (B) zirconic compound with oxyful; wherein the (A) titanium compound is at least one selected from low condensate of hydrolytic titanium compound, hydrolytic titanium compound and low condensate of titanic hydroxide and titanic hydroxide. The (B) zirconic compound is at least one selected from low condensate of hydrolytic zirconic compound, hydrolytic zirconic compound and low condensate of zirconic hydroxide and zirconic hydroxide. In addition, the invention further provides a titanium / zirconic film forming method and coated metal basal material of capsule formed by coating agent.

Description

technical field [0001] The invention relates to a novel coating agent for forming a titanium / zirconium film, a method for forming a titanium / zirconium film and a metal substrate coated with a titanium / zirconium film. Background technique [0002] In the past, methods for forming a titanium oxide film include: (1) a method of coating a titanium oxide sol on a substrate and then sintering it; (2) coating an aqueous solution of titanium chloride or titanium sulfate on a substrate (3) The plasma spraying method in which the solid particles are melted in the plasma generated in the air and sprayed onto the surface of the substrate; (4) The oxide target is sputtered in vacuum (5) The CVD method of volatilizing organometallic compounds and the like and decomposing them in an electric furnace to form a film on the substrate; (6) Coating the sol obtained by hydrolyzing the metal alkoxide cloth on the base material, and then sintered sol-gel method, etc. [0003] However, in the met...

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Problems solved by technology

[0003] However, in the methods (1) to (6) above, there are problems as follows: In the method (1), since cracks and peeling will occur when the film thickness is more than 0.1 μm, the film-forming property is poor, and it needs to be heated at several hundreds of degrees. Carry out sintering under the temperature above; (2) method, thermal decomposition product has bad influence to base material, needs to carry out sintering under the temperature of hundreds of degrees above; (3) method can not form compact film, and the adhesion to base material The method of (4) and (5) must be under reduced pressure to obtain a good film, and a reaction vessel that can be vacuumed is required. In addition, the film forming speed is generally slow. In order to obtain a dense film, the substrate needs to be heated to hundreds of degrees. Above; (6) method, the sol used is added with acid or alkali or organic matter, there is a problem of corrosion of the coated material, and in order to remove the organic matter, it needs to be operated above 400 ° C

[0005] But, the shortcoming of these two kinds of methods is: the method of (7) takes a long time to form film, and the processing of fluoride is troublesome; Pure membrane, it is difficult to control the pH and its variation will lead to different membranes, etc.

In order to add the above-mentioned titanium-based coating solution in a stable state, zirconium halides such as zirconium fluoride are generally used (Japanese Patent Application Laid-Open No. 2002-60975), but due to the presence of toxic substances such as hydrogen fluoride, its use is restricted by the application. limit

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