Pyrophosphate copper plating used as grounding electroplate liquid for cyanogen-free copper plating
A technology of pyrophosphate and cyanide-free copper plating, which is applied in the field of copper plating solution, can solve problems such as difficulty in realizing industrialized production, high requirements for operators, and cumbersome preparation of plating solution, so as to improve coverage, increase cathode polarization, The effect of expanding the range of cathode current density
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0029] First add pure water accounting for 70% of its volume into the reaction tank; add potassium pyrolysis and stir to dissolve; add copper pyrolysis and stir to dissolve; Azobenzene, dextrin, alkylthiourea, and 8-hydroxynaphthylbenzene were stirred and dissolved, and prepared into an electroplating solution containing the following concentration by weight: 25% potassium pyrophosphate, 2% copper pyrophosphate, 2% ammonium citrate, Sorbitol 3%, 2-ethanesulfonate nitrogen benzene 0.8%, 3-methanol base nitrogen benzene 3%, dextrin 1.5%, alkylthiourea 0.1%, 8-hydroxynaphthalene benzene 0.08%, in the electroplating production process When the concentration of the medium electroplating solution is insufficient, add raw materials containing the following percentages by weight: 6% potassium pyrophosphate, 82.5% copper pyrophosphate, 2% ammonium citrate, 3% sorbitol, and 1% benzenesulfonate , 3-methanolyl nitrogen benzene 2%, dextrin 3.3%, alkylthiourea 0.1%, 8-hydroxynaphthylbenzene...
Embodiment 2
[0031] First add pure water accounting for 70% of its volume into the reaction tank; add pyropotassium, stir to dissolve; add pyrocopper, stir to dissolve; add ammonium citrate, sorbitol, naphthalene disulfonic acid, 2,3-azobenzenedicarboxylate Acid, dextrin, alkylthiourea, benzotriazole, stir and dissolve, and prepare the electroplating solution containing the following weight percentage concentration: potassium pyrophosphate 35%, copper pyrophosphate 4%, ammonium citrate 2%, sorbic acid 2% alcohol, 1% naphthalene disulfonic acid, 4% 2,3-nitrobenzenedicarboxylic acid, 1% dextrin, 0.3% alkylthiourea, 0.4% benzotriazepine; then add the following volume percentage Concentration of hydroxyethylidene diphosphate 10-20%, sodium tripolyphosphate 1-5%, EDTA·2Na 1-2%, ethylene glycol 5-8%, methylthioureazone 1-2%, diphenylamine sulfonate acid 0.5-1%; when the concentration of the electroplating solution is insufficient in the electroplating production process, add raw materials contai...
Embodiment 3
[0033] First add pure water accounting for 70% of its volume into the reaction tank; add pyropotassium, stir to dissolve; add pyrocopper, stir to dissolve; add ammonium citrate, sorbitol, glutaric acid sulfonate, butyl nicotinate, paste Essence, alkylthiourea, 8-hydroxynaphthalene benzene, stir and dissolve, and prepare the electroplating solution containing the following weight percentage concentration: potassium pyrophosphate 30%, copper pyrophosphate 3%, ammonium citrate 2%, sorbitol 1.2%, 0.8% of glutaric acid sulfonate, 3% of butyl nicotinate, 1% of dextrin, 0.3% of alkylthiourea, 0.25% of 8-hydroxynaphthalenebenzene; -20%, sodium tripolyphosphate 1-5%, EDTA·2Na1-2%, ethylene glycol 5-8%, methylthioureazone 1-2%, diphenylamine sulfonic acid 0.5-1%; in electroplating In the production process, when the concentration of the electroplating solution is insufficient, add raw materials containing the following weight percentages: potassium pyrophosphate 7%, copper pyrophosphate...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com