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Constituting method for metal ordered structure surface reinforced base

A technology of ordered structure and surface enhancement, applied in the fields of nanostructure fabrication, Raman scattering, nanotechnology, etc., can solve the problems of expensive instruments, limited application, low efficiency, etc.

Inactive Publication Date: 2007-08-29
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the method of electron beam etching has the advantages of high precision and high resolution, its wide application is limited due to the disadvantages of expensive equipment and low efficiency.

Method used

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  • Constituting method for metal ordered structure surface reinforced base
  • Constituting method for metal ordered structure surface reinforced base
  • Constituting method for metal ordered structure surface reinforced base

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0091] Take a small amount of thermoplastic polymer MRI-7030 (Micro Resist Company, Germany) and spin-coat it on the treated ITO surface. The spin-coating thickness is about 300nm. Acetone, ethanol and high-purity water were ultrasonically cleaned for 5 minutes, dried with high-purity nitrogen, and then treated with oxygen plasma at a power of 200 mW for 3 minutes to activate the ITO surface. Using the 2.5-inch nano-imprinting machine produced by Sweden's OBDUCAT company, the template of silicon nitride material (constructed by electron beam etching method, its structure is divided into two parts, one part is a lattice structure, the size of the point The range is 800nm×800nm~10μm×10μm, and the pitch size range of dots is 800nm~10μm; the other part is a strip structure, whose line width and line spacing are 800nm~10μm) to build a complementary structure of polymer and template Ordered structure, that is, the use of nanoimprinting method to build microstructures on the surface ...

Embodiment 2

[0095] Take a small amount of polymethyl methacrylate PMMA (sigma-aldrich) and spin-coat it on the treated ITO surface. The spin-coating thickness is about 300nm. Ultrasonic cleaning for 5 minutes, drying with high-purity nitrogen, and using oxygen plasma at a power of 200 mW for 3 minutes to activate the ITO surface. Using the 2.5-inch nano-imprinting machine produced by Sweden's OBDUCAT company, the template of silicon nitride material (constructed by electron beam etching method, its structure is divided into two parts, one part is a lattice structure, the size of the point The range is 800nm×800nm~10μm×10μm, the pitch size range of dots is 800nm~10μm, and the other part is a strip structure, whose line width and line spacing are 800nm~10μm) to build a complementary order of polymer and template structure Structure (one part is a concave dot matrix structure, and its size ranges from 800nm×800nm ​​to 10μm×10μm, and the pitch is 800nm ​​to 10μm; the other part is a strip str...

Embodiment 3

[0097] Spin-coat a small amount of polystyrene PS (sigma-aldrich) on the treated ITO surface with a spin-coating thickness of about 300nm. The treatment method is to cut the ITO into a size of 2cm×2cm, and then use acetone, ethanol and high-purity water to ultrasonically clean it for 5min. , after blowing dry with high-purity nitrogen gas, use oxygen plasma to activate the ITO surface with a power of 200mW for 3min. Using the 2.5-inch nano-imprinting machine produced by Sweden's OBDUCAT company, the template of silicon nitride material (constructed by electron beam etching method, its structure is divided into two parts, one part is a dot matrix structure, the size of the dots The range is 800nm×800nm~10μm×10μm, the pitch size range of dots is 800nm~10μm, and the other part is a strip structure, whose line width and line spacing are 800nm~10μm) to build a complementary order of polymer and template structure Structure (one part is a concave dot matrix structure, and its size r...

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Abstract

The invention relates to a method to construct ordered structure on base, and the application of using the base to construct metal ordered structure. The method includes the following steps: adopting inorganic base or polymer base, taking base surface process to make it could conduct electricity, construct ordered microstructure of different functional group or macromolecule barrier layer; assembling the metal nanometer particle into the ordered structure to gain metal nanometer ordered structure. The invention could be widely used in making high sensitive metal sensor and detector.

Description

technical field [0001] The invention belongs to the ordered microstructure technology, and specifically relates to constructing a surface ordered structure on a substrate, and using the ordered structure substrate as a template to construct a metal ordered structure. Needle Molecular Signaling Applications. Background technique [0002] The traditional methods of constructing microstructure mainly include: photolithography, electron beam etching, self-assembled monolayer film, chemical vapor deposition, etc.; in this patent, the non-traditional methods involved include: nanoimprint technology, LB self-assembly technology, and the method of atomic force assisted electrochemical oxidation, etc. [0003] It is reported in the literature that in order to realize the construction of metal structures, scientific and technical workers have carried out a lot of research work, the most influential of which is the method of electron beam etching. As early as 1984, H.G.Craighead and G...

Claims

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Application Information

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IPC IPC(8): B82B3/00G01N21/65
Inventor 吕男杨秉杰黄春玉迟力峰
Owner JILIN UNIV
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