808nm large-power quantum well laser in non-aluminum active region of asymmetric structure
An active region and quantum well technology, which is applied in the field of 808nm quantum well lasers, can solve the problems of weak lateral mode confinement and unstable output mode, and achieve the effects of improving confinement, increasing optical confinement factor, and reducing optical absorption loss
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[0012] As shown in the accompanying drawings, the structure of the asymmetric aluminum-free active region 808nm high-power quantum well laser of the present invention is, from bottom to top, substrate 1, buffer layer 2, lower confinement layer 3, lower waveguide layer 4, and quantum well layer. 5. Upper waveguide layer 6 , barrier confinement layer 7 , upper confinement layer 8 , transition layer 9 and ohmic contact layer 10 . The substrate 1 is used for epitaxial growth of materials of various layers of the laser thereon, and the substrate is an N-type highly doped gallium arsenic material of the (100) plane. The buffer layer 2 is grown on the substrate 1 and is an N-type highly doped GaAs material. The lower confinement layer 3 is grown on the buffer layer 2 and is an N-type AlGaInP material. The lower waveguide layer 4 is grown on the lower confinement layer 3 and is made of gallium indium phosphide material. The quantum well layer 5 is grown on the lower waveguide layer ...
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