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Small electron gun

a small electron gun and electron gun technology, applied in the field of electron gun, can solve the problems of limiting the downsizing of the ion pump, the inability to substantially keep a high vacuum pressure, and the difficulty of downsizing the ion pump, and achieve the effect of high vacuum pressur

Inactive Publication Date: 2007-10-11
HITACHI HIGH-TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This configuration effectively maintains a vacuum pressure of approximately 10−10 Torr, reducing the size of the electron gun while extending its service life and enabling high-resolution imaging and drawing applications.

Problems solved by technology

However, with conventional methods, it is difficult to downsize an ion pump because the pump has a large size and a magnetic field leaks and it is necessary to set the ion pump by keeping a certain distance from an electron gun as shown in FIG. 2.
However, because the diameter of the ion pump housing is at least approximately tens of centimeters, there is a limit in downsizing the ion pump.
However, when using the nonevaporative getter pump, it is difficult to exhaust a rare gas such as helium or argon and a chemically stable gas such as methane, it is impossible to substantially keep a high vacuum pressure, and thus the pump is not practically used yet.
However, when using a chemically stable gas such as a rare gas or fluorocarbon gas, it is difficult to exhaust the gas because it is completely equilibrium.

Method used

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Experimental program
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first embodiment

[0033]FIG. 1 shows a configuration of an electron gun of this embodiment. An electron source uses a thermal-field-emission electron gun (TFE) 1. The electron source 1 is set to the flange of an ICF 70 [WHAT IS “ICF 70”->It's a standard of flange used in a vacuum industry] and connected with an introduction terminal 12 to an electrode (suppressor, drawer, or chip) (not shown). The electron source 1 is inserted into and fixed to an electron-gun column 10.

[0034] The inside diameter of this column is approximately 37 mm. The column 10 has a sheeted nonevaporative getter pump 2 along the inside diameter. The nonevaporative getter pump 2 is activated when overheated to take in air. Therefore, a first heater 4 is set to the outside of the electron-gun column 10. This embodiment uses the heater 4 by winding a sheath heater on the electron-gun column 10. Note that a nonevaporative getter-pump heating device may be set in the vacuum vessel, in other words, the electron-gun column 10. A therm...

second embodiment

[0043] This embodiment describes the electron gun, described in the first embodiment, as applied to a scanning electron microscope.

[0044]FIG. 3 shows a schematic configuration of the scanning electron microscope of this embodiment. From the viewpoint of being advantageous for downsizing, every electronic optical system used in this embodiment uses a small electronic optical system constituted by an electrostatic lens. In FIG. 3, an electron beam 18 field-emitted from a field-emission electron gun 17 is thinly converged by electric fields formed between electrodes of an electrostatic lens set below the electron gun 17 and applied onto a sample 25. The electrostatic lens comprises a third lens electrode 19, a second lens electrode 20, and a first lens electrode 21.

[0045] At the same time, the electron beam 18 is deflected in the internal space of the second lens electrode 20 by a deflector 24 to two-dimensionally scan the surface of the sample 25. Moreover, to align the optical axis...

third embodiment

[0051] This embodiment describes the electron gun, described in the first embodiment, as applied to an electron-beam drawing apparatus. To provide a pattern drawing function for the small scanning electron microscope described in the second embodiment, the microscope may be used as an electron-beam drawing apparatus.

[0052]FIG. 4 is a schematic diagram of an electron-beam drawing apparatus of the third embodiment. It is possible to draw a pattern having a resolution of 6 nm on a resist film applied onto a sample 31 by sequentially reading data from a pattern record control device 30, previously storing the data for the layout of a pattern and the like, and deflecting an electron beam 18 by a deflector 24 so as to form the pattern. Moreover, it is possible to detect the position of a pattern to be drawn by detecting a secondary electron beam 33 generated from a region nearby a positioning mark, not shown, by a secondary electron detector 26.

[0053] Because this embodiment uses an acc...

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Abstract

To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening / closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

Description

CROSS-REFERENCE TO RELATED APPLICATION [0001] This application is a Continuation of U.S. application Ser. No. 10 / 873,358 filed Jun. 23, 2004. This application claims priority to U.S. application Ser. No. 10 / 873,358 filed Jun. 23, 2004, which claims priority to Japanese Patent Application Nos. 2003-317703 and 2004-111682 filed on Sep. 10, 2003, and Apr. 6, 2004, respectively, all of which is incorporated by reference.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to an electron gun of an electron microscope or electronic drawing apparatus, particularly to downsizing of an electron gun. [0004] 2. Discussion of Background [0005] A conventional scanning electron microscope (SEM) or electron-beam drawing apparatus (EB) accelerates an electron beam emitted from an electron gun constituted by a field-emission or thermal-field-emission electron source, forms the electron beam into a thin electron beam by an electron lens, forms the thin ele...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01J17/24H01J37/18H01J7/16H01J7/18H01J37/07H01J37/073H01J41/20
CPCH01J7/16H01J7/18H01J37/07H01J37/18H01J2237/188H01J2237/062H01J2237/06316H01J2237/1825H01J2237/022
Inventor KATAGIRI, SOICHIOHSHIMA, TAKASHI
Owner HITACHI HIGH-TECH CORP
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