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Stripping liquid composition for photoresist

A stripping solution and composition technology, applied in optics, opto-mechanical equipment, photosensitive material processing, etc., can solve the problems of operator health hazards, low toxicity, low volatility, etc., and achieve less evaporation loss, low volatility, The effect of low surface tension

Inactive Publication Date: 2003-03-12
DUKSUNG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] 4. Low volatility / low toxicity does not cause environmental problems, and there is no risk of harming the health of operators,

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0024] 1. Manufacture of Stripping Liquid Composition

[0025] A stripping liquid composition composed of an organic amine and a polar solvent in a uniform ratio as shown in Table 1 below was produced through Examples 1 to 8 and Comparative Examples 1 to 2.

[0026] Each embodiment of table 1 and non-effective stripping liquid composition

[0027] category

MEAs

BDG

DPM

DPMA

NMP

Example 1

10

70

20

-

-

Example 2

20

70

10

-

-

Example 3

20

60

20

-

-

Example 4

30

60

10

-

-

Example 5

30

50

20

-

-

Example 6

20

40

40

-

-

Example 7

10

60

30

-

-

Example 8

30

60

-

10

-

Comparative example 1

30

70

-

-

-

Comparative example 2...

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PUM

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Abstract

Provided is an exfoliating solution composition for photoresist, which is excellent in solubility and exfoliating property and has the low corrosiveness against metal wires and minimizes the impregnation into O-rings and pipe lines and has low volatility and low toxicity which minimizes the environmental pollution and the toxicity problems for the operators. The exfoliating solution composition comprises 10-40wt% of an organic amine compound and 10-80wt% of at least one protogenic polar solvent selected from the group consisting of ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol monophenyl ether, butyl carbitol, diethylene glycol monoethyl ether, and etc., wherein the composition always contains at least 5-30wt% of dipropylene glycol monomethyl ether and / or dipropylene glycol monomethyl ether acetate as a low toxic / hydrophilic polar solvent in the polar solvent.

Description

technical field [0001] The present invention relates to a stripper composition for modified photoresist used in processes such as etching and ion implantation in the manufacturing processes of semiconductor elements and liquid crystal display elements, etc. Metal wiring such as aluminum or copper in the lower part has low corrosion resistance, and the least aggressive stripping liquid composition for O-ring and its accessory material pure polyvinyl chloride, due to the low volatility / low Toxicity, which can minimize environmental concerns which have been recent topics, as well as toxicity to operators. Furthermore, the peeling liquid composition of the present invention has a small amount of evaporation loss with the use temperature, and economically, it is not only environmentally friendly, but also has low viscosity and excellent roving performance in a water tank. , Excellent affinity for glass substrates during the rinse process with isopropanolamine (IPA) and deionized w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32G03F7/42
CPCG03F7/34G03F7/422G03F7/425G03F7/426H01L21/02071H01L21/0274
Inventor 崔好星金址洪金泰根吕相赫朴海成
Owner DUKSUNG
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