Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Cleaning method for crucible assembly of electron beam evaporation table

A technology of electron beam evaporation and cleaning method, which is applied in the cleaning field of crucible components of electron beam evaporation table, can solve the problems of cumbersome operation, incomplete cleaning, and high cost, and achieve the effect of fast and effective method, convenient cleaning and removal operation, and low cost

Pending Publication Date: 2022-05-13
SHANDONG INSPUR HUAGUANG OPTOELECTRONICS
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This device is used for cleaning during vapor deposition, and it can only clean the surface of the crucible mouth and large metal pieces, and the cleaning is not thorough. In addition, a laser light source is added, which is costly and cumbersome to operate.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cleaning method for crucible assembly of electron beam evaporation table
  • Cleaning method for crucible assembly of electron beam evaporation table
  • Cleaning method for crucible assembly of electron beam evaporation table

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] This embodiment provides a method for cleaning the crucible assembly of an electron beam evaporation table, and the operation steps are as follows:

[0034] (1) Coating production: place a baffle plate 6 above the crucible 3, use boron nitride spray to spray a layer of boron nitride above the baffle plate, and the spraying direction 7 is as follows: figure 2 As shown, the boron nitride spray is evenly distributed on the side wall of the crucible, and the baffle plate 6 is removed after the spraying is completed;

[0035] (2) Crucible use: place a metal evaporation source in the crucible sprayed with boron nitride spray coating, and evaporate metal;

[0036] (3) Crucible cleaning: use tools to scrape off the metal layer on the side wall 5 of the crucible to complete the crucible cleaning.

[0037] The baffle plate 6 described in the step (1) is a circular baffle plate, and the diameter of the baffle plate is larger than the diameter of the crucible, so as to ensure tha...

Embodiment 2

[0043] A method for cleaning the crucible assembly of an electron beam evaporation table, the operation steps are as described in Example 1, the difference is that the thickness of the boron nitride spray coating in step (1) is 300 μm.

[0044] The tool used in step (3) is a blade.

[0045] After cleaning by the cleaning method of this embodiment, the residual amount of the metal layer on the side wall of the crucible is 0.

Embodiment 3

[0047]A method for cleaning the crucible assembly of an electron beam evaporation table, the operation steps are as described in Example 1, the difference is that the boron nitride spray described in step (1) is a BN-Q type spray, and BN-Q Type spray is an anti-bonding protective material, and its boron nitride content is more than 99%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a cleaning method for a crucible assembly of an electron beam evaporation table, and belongs to the technical field of semiconductor processing. The method comprises the following operation steps: (1) preparing a coating: placing a baffle plate above a crucible, spraying a layer of boron nitride above the baffle plate by using a boron nitride spraying agent, uniformly distributing the boron nitride spraying agent on the side wall of the crucible, and taking away the baffle plate after spraying is completed; (2) crucible use: metal evaporation; and (3) cleaning the side wall of the crucible. The boron nitride spraying agent is sprayed on the side wall of the crucible, so that the adhesion degree between the side wall of the crucible and a metal layer is low, a large number of metal layers can be conveniently accumulated, cleaning and removing operation is convenient, a boron nitride spraying agent coating can tolerate the high-temperature environment of 1000 DEG C or above, it is guaranteed that an evaporation source in the crucible can be normally melted, and meanwhile the evaporation source in the crucible can not be damaged. And the material on the side wall of the crucible cannot be melted and flows into the crucible, so that the normal evaporation use of the crucible is ensured.

Description

technical field [0001] The invention relates to a cleaning method for a crucible assembly of an electron beam evaporation table, belonging to the technical field of semiconductor processing. Background technique [0002] A light-emitting diode, referred to as LED (Light Emitting Diode), is a semiconductor component. Light-emitting diode emits light through the recombination radiation of electrons and holes. It is a device that relies on semiconductor P-N junctions for electroluminescence. It is made of compounds such as nitrogen, arsenic, gallium, and phosphorus, and can convert electrical energy into light energy. The structure of the LED is mainly composed of two electrodes, namely the P-side electrode and the N-side electrode, and the general method of electrode production is to form metal materials by evaporation or sputtering of electron beam evaporation tables. The specific working principle is to load high voltage The filament of the electron gun emits a high-energy ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/30
CPCC23C14/30C23C14/243
Inventor 徐晓强程昌辉吴向龙闫宝华王成新
Owner SHANDONG INSPUR HUAGUANG OPTOELECTRONICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com