Composition for preparing top antireflection film, top antireflection film and fluorine-containing composition
An anti-reflection film and composition technology, which is applied to photosensitive materials for opto-mechanical equipment, opto-mechanical equipment, photo-engraving process of patterned surfaces, etc., can solve problems such as low refractive index, and achieve low cost of raw materials and good Solution stability and film-forming properties, and the effect of improving yield
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0057] Preparation of perfluoropolyether carboxylic acid
[0058] (1) First add 50ml of acetonitrile and 50ml of tetraethylene glycol dimethyl ether into a 1L polymerization kettle, then add 5g of catalyst KF into the polymerization kettle, stir and mix evenly, replace with high-purity nitrogen three times, and pump negative pressure to -0.1MPa, lower the temperature to the set temperature of 0°C, feed 50g of hexafluoropropylene oxide, adopt timing feeding (50g / h), control the reaction process, and control the temperature between 0-10°C; add hexafluoropropylene oxide After propane reaches 1000g, return to normal pressure, after the reaction is completed, keep stirring for two hours, stop stirring, return to room temperature, and obtain the mixture;
[0059] (2) The mixture is layered, and the product in the lower layer is centrifuged and filtered to separate the reaction product 1, and the reaction product 1 is added to the distillation device; through rectification and purifi...
Embodiment 1
[0065] The above-mentioned perfluoropolyether carboxylic acids with different degrees of polymerization are mixed, and the mixing ratio is as follows: by weight, 4wt% perfluoropolyether carboxylic acid A, 55wt% perfluoropolyether carboxylic acid B, 38wt% perfluoropolyether carboxylic acid Ether carboxylic acid C, 3wt% perfluoropolyether carboxylic acid D to prepare a perfluoropolyether carboxylic acid composition, the specific composition of which is shown in Table 1.
[0066] Prepare 0.0064 moles of perfluoropolyether carboxylic acid into a 2wt% aqueous solution, and then mix it with 2wt% polyvinylpyrrolidone aqueous solution at a molar ratio of perfluoropolyethercarboxylic acid to polyvinylpyrrolidone of 10:1, and stir until a transparent solution; under stirring condition, add 2wt% tetramethylammonium hydroxide solution in the solution again, the consumption of tetramethylammonium hydroxide is 0.584g; Then, add surfactant isopropanol 1.32g, add ethylene glycol acid 2.0g, ad...
Embodiment 2
[0069]Mix the above-mentioned perfluoropolyether carboxylic acids with different degrees of polymerization, and the mixing ratio is as follows: by weight, 2wt% of perfluoropolyether carboxylic acid A, 40wt% of perfluoropolyether carboxylic acid B, 48wt% of perfluoropolyether carboxylic acid Ether carboxylic acid C, 10wt% perfluoropolyether carboxylic acid D to prepare a perfluoropolyether carboxylic acid composition, the specific composition of which is shown in Table 1.
[0070] A composition solution was obtained in the same manner as in Example 1 except that 1.32 g of the surfactant hexafluoroisopropanol was used instead of isopropanol. By weight, the composition solution consists of 1.74wt% perfluoropolyether carboxylic acid composition, 0.026wt% polyvinylpyrrolidone, 0.21wt% tetramethylammonium hydroxide, 0.475wt% hexafluoro Isopropanol, 0.72wt% oxalic acid, 96.829wt% water.
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
refractive index | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com