Method for enhancing internal quantum efficiency of ultraviolet LED through femtosecond laser
A technology of internal quantum efficiency and femtosecond laser, which is applied in the field of femtosecond laser-enhanced internal quantum efficiency of ultraviolet LEDs, can solve problems such as complex experimental steps, experimental environment, and performance of GaN-based LEDs. The method is simple and easy to achieve, and enhances the internal quantum efficiency. Efficiency, ease of production
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[0021] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0022] A method for enhancing the quantum efficiency of ultraviolet LEDs by femtosecond laser, such as figure 1 Shown:
[0023] Step 1: GaN-based MQW LED structures are grown on sapphire substrates by epitaxial growth
[0024] (1) if figure 1 As shown, the LED from top to bottom is p-type GaN 4, InGaN multiple quantum well 5, n-type GaN 6, AlN buffer layer 7, and sapphire substrate 8;
[0025] (2) Use inductively coupled plasma technology to etch to expose the n-type GaN layer, such as figure 1 As shown in the middle step type, the thickness of the p-type GaN layer is 100nm, the thickness of the InGaN multiple quantum well is 50nm, and the thickness of the n-type GaN layer is 2μm.
[0026] Step 2: Preparation of Metal Grid Transparent Electrode
[0027] (1) Spin-coat AR 300-80new adhesion promoter on the surface of the LED at a spin-coating speed o...
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