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Method for manufacturing two-stage micro-nano structure array based on template

A micro-nano structure and array technology, applied in the manufacture of micro-structure devices, micro-structure technology, micro-structure devices, etc., can solve problems such as poor bonding strength, alignment, and nano-film shedding, and achieve good strength, long life, and high efficiency Effect

Active Publication Date: 2021-06-25
BEIJING INSTITUTE OF TECHNOLOGYGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the micro-nano two-level structure prepared by the composite technology of nano-material coating on the surface of the micro-structure, the nano-column structure exists on the nano-film material and cannot be arranged according to a fixed azimuth angle. Structural Surface Coating
Nanostructured materials are inconsistent with microstructured materials, so it is impossible to prepare micro-nano two-level structures with the same materials
Secondly, the connection between the two-level structures depends on the adhesion of the film material on the surface of the microstructure. This combination is not permanent and will fall off with the failure of the nano-film in extreme environments.
[0004] Since the microstructure template self-assembly method is a nanostructure formed by the self-assembly of nanospheres, it cannot meet the processing requirements of nanopillars on the surface of the microstructure, and it is also unable to form an array of nanopillars arranged at a specific angle on the surface of the microstructure.
Moreover, the bonding strength between the self-assembled nanospheres and the microstructure is poor, and the nanospheres are easy to fall off under ultrasonic vibration, humid environment, etc., and the formed micro-nano two-level structure is unstable.

Method used

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  • Method for manufacturing two-stage micro-nano structure array based on template
  • Method for manufacturing two-stage micro-nano structure array based on template

Examples

Experimental program
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Effect test

Embodiment 1

[0037] like figure 1 As shown, this embodiment provides a method for manufacturing a two-level micro-nano structure array based on a template, including the following steps:

[0038] Step 1, micro-groove template manufacturing, using diamond tool ultra-precision cutting technology to process high-quality micro-groove arrays on the surface of workpieces (copper, aluminum, resin, nickel phosphide, etc.) (micro-groove period d = 1 ~ 100 μm) , the parallelism of the micro-groove array should be kept within 1% (parallelism deviation to period ratio), and the surface roughness of the micro-groove should be less than 10nm to ensure that the subsequent SiO 2 The orderliness of nanosphere self-assembly.

[0039] Step 2, first coat a layer of uniform photoresist (such as SU-8, PMMA, PDMS, PS, etc.) on the high-quality micro-groove template and cure the photoresist on the surface of the micro-groove by drying or ultraviolet radiation, The photoresist thickness is controlled within 1 μm...

Embodiment 2

[0047] This embodiment is an improvement on the basis of the first embodiment, and its improvement lies in: figure 2 As shown, in the seventh step, the material etching includes a first angle etching and a second angle etching.

[0048] Specifically, in the first angle etching, the thin-layer mesh-shaped resist metal layer is used as the masking film, and the dry etching (ICP) method is used to selectively select the direction parallel to the second etching surface 2 of the micro-trench template. Remove the circular photoresist and workpiece areas that are not covered by the masking film on the first etching surface 1, the circular area has the same diameter as the self-assembled nanosphere, and the direction of the nanohole is parallel to the second etching face 2 direction.

[0049] In the second angle etching, the thin mesh-shaped resist metal layer is used as the mask film, and the dry etching (ICP) method is used to selectively etch the second The circular photoresist ...

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Abstract

The invention discloses a method for manufacturing a two-stage micro-nano structure array based on a template, and relates to the technical field of micro-nano two-stage structure preparation, which comprises the following steps: 1, manufacturing a micro groove template; 2, uniformly plating a layer of photoresist on the micro-groove template; 3, guiding the SiO2 nanospheres to be self-assembled by the micro-groove template; 4, taking out the micro-groove template on which the SiO2 nanospheres are self-assembled, and drying the micro-groove template; 5, plating an anti-corrosion metal film; 6, removing the SiO2 nanospheres; 7, etching the material; 8, removing the residual photoresist and the netted anti-corrosion metal layer on the surface of the micro-groove, and finally preparing an orderly arranged nano-pore structure on the surface of the micro-groove. According to the preparation method disclosed by the invention, the micron-level structure and the nano-level structure can be ensured to have good uniformity, and the two-level structure has relatively good strength.

Description

technical field [0001] The invention relates to the technical field of micro-nano two-level structure preparation, in particular to a method for manufacturing a two-level micro-nano structure array based on a template. Background technique [0002] The micro-nano two-level structure surface has unique and excellent properties in terms of hydrophilicity and hydrophobicity, frictional drag reduction, anti-reflection, anti-reflection and anti-reflection, etc., so there is a huge demand for the manufacture of micro-nano two-level structures. The manufacturing of micro-nano two-level structures is facing bottlenecks such as lack of means, poor process stability, and low processing efficiency. At present, the composite etching technology using self-assembled nanospheres as a mask can only prepare single-level structures such as nanoholes / nanopillars on a plane. The technology for preparing two-level structures in large quantities with high efficiency still stays in the technology...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00B82Y40/00
CPCB81C1/00087B81C1/00031B81C1/00531B82Y40/00
Inventor 周天丰贺裕鹏许汝真刘朋赵斌梁志强刘志兵解丽静王西彬
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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