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Visible infrared window antireflection film based on magnetron sputtering and preparation method

A technology of infrared window and anti-reflection coating, which is applied in the direction of sputtering coating, ion implantation coating, metal material coating process, etc., can solve the problem of film layer damage, large absorption, single-layer hafnium oxynitride film cannot meet multi-spectrum Anti-reflection and other issues

Active Publication Date: 2021-04-06
江苏北方湖光光电有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] 1. Conventional high-efficiency anti-reflection coatings use materials with low hardness such as ytterbium fluoride and zinc sulfide. Although they can meet the requirements of optical use, they are easy to cause damage to the coating in harsh environments such as deserts and rainforests;
[0004] 2. Diamond-like film is often used as a conventional hard protective film for infrared protection materials, but it has high internal stress and large absorption, and it is difficult to deposit thick films;
[0005] 3. Diamond film is the most ideal choice for protective film, but there are big problems in large-area deposition, thermal mismatch, cost, etc.;
[0006] 4. It has been reported that hafnium oxynitride film can be used for the protection of infrared zinc sulfide materials, but the refractive index of the film is relatively close to that of zinc sulfide materials, and the reported single-layer hafnium oxynitride film cannot meet the requirements of multi-spectral anti-reflection

Method used

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  • Visible infrared window antireflection film based on magnetron sputtering and preparation method
  • Visible infrared window antireflection film based on magnetron sputtering and preparation method
  • Visible infrared window antireflection film based on magnetron sputtering and preparation method

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Embodiment 1

[0029] The invention provides a method for preparing a visible infrared window anti-reflection film based on magnetron sputtering, comprising the following steps:

[0030] Step 1: Clean the cathode target, and install the No. 1 Al target, the No. 2 Ti target, and the No. 3 Y target in sequence;

[0031] Step 2: Put the cleaned parts to be plated into the processed coating fixture, place them in the parts tray of the coating machine, press the vacuum chamber door tightly, and start vacuuming;

[0032] Step 3: background vacuum rP≤3.0×10 -6 When torr, start the coating program;

[0033] Step 4: Pre-sputtering the target material, the pre-sputtering time of each target depends on the surface state, until there are no splashed ideas.

[0034] Step Five: Sputter Y 2 o 3 Film layer, cathode power 3.8kw, argon gas 60-70sccm, ion source power 2kw, oxygen 25sccm, deposition rate 0.23nm / s;

[0035] Step 6: Sputter TiO 2 Film layer, cathode power 4kw, argon gas 50-60sccm, ion sourc...

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Abstract

The invention discloses a visible infrared window antireflection film based on magnetron sputtering and a preparation method, and belongs to the technical field of optical films. A magnetron sputtering coating method is mainly used, a conventional situation that efficient antireflection films are made of ytterbium fluoride, zinc sulfide and other soft film materials with low hardness is abandoned, but yttrium oxide, titanium oxide, aluminum oxide and other hard oxide protective films are used, and the visible, low-light and infrared common-window high-strength antireflection film capable of being used for a zinc sulfide base is formed through design optimization. The reflectivity of the film system can be 5% within the wave band range of 0.4-0.75um and 1.57 um, the transmittance of the film system can be larger than 92% within the wave band range of 7.4-10.7um, the surface quality and the firmness of a film layer are good, and the film system can resist friction tests specified in GJB2485-95 and test requirements of temperature, damp heat, salt mist and the like specified in GJB150A-2009.

Description

technical field [0001] The invention relates to the technical field of optical thin films, in particular to a magnetron sputtering-based visible infrared window anti-reflection film and a preparation method. Background technique [0002] CVD ZnS has a wide transmission band (0.6-13Lm), and can be cheap and large in size. It is the best material for the visible and infrared windows of military photoelectric observation and sighting instruments. However, due to its low surface hardness, the optical surface is vulnerable to damage when traveling at high speed. The infrared transmittance decreases due to damage, so the surface needs to be coated with a protective film; the protective films applied to the infrared window are mainly concentrated in diamond film, diamond-like film, boron phosphide film, germanium carbide film, hafnium oxynitride film, etc. [0003] 1. Conventional high-efficiency anti-reflection coatings use materials with low hardness such as ytterbium fluoride an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/35
CPCC23C14/081C23C14/083C23C14/352C23C14/3485C23C14/0036
Inventor 陆丹枫李斯成唐乾隆査家明汶韬
Owner 江苏北方湖光光电有限公司
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