5G base station protection chip manufacturing process
A technology for protecting chips and manufacturing processes, which is applied in the field of 5G base station protection chip manufacturing processes, and can solve problems such as channel diffusion leakage current and poor chips
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[0024] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.
[0025] see Figure 1 to Figure 2 , the present invention provides a technical solution: a 5G base station protection chip manufacturing process, comprising the following steps:
[0026] S1. Pre-diffusion treatment: use P-type single crystal silicon wafers, and carry out chemical treatment on the surface of silicon wafers through processes such as cleaning with acid and Shengchi 3# formula;
[0027] S2. Oxidation: grow a layer of oxide layer on the silicon wafer that has been pre-diffused in an oxidation furnace at a certain temperature;
[0028] S3. Photolithography: apply glue, exposure, development, and deoxidation to the oxidized silicon wafer, and engrave a diff...
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