A kind of temperature-resistant thickening light-curable epoxy vinyl ester resin and preparation method thereof
An epoxy vinyl ester and epoxy resin technology, which is applied in the polymer field, can solve the problems of reducing the corrosion resistance of vinyl ester resin, unable to be used for simultaneous temperature resistance, corrosion resistance, and material thermal deformation temperature drop. Good compatibility, increased light-curing speed and light-curing depth, and high hydroxyl content
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0048] Put 180.0g of bisphenol A type epoxy resin E12 and 250.0g of methylol bisphenol A type epoxy resin EL-50 into the reactor, heat up to 105°C, stir evenly, add 2.0g of p-tert-butylcatechol, Stir for 10 minutes, add 114.4g of methacrylic acid, control the temperature to stabilize to 90°C, and slowly add 1.2g of benzyltrimethylammonium chloride and 0.4g of 2-ethyl-4-methylimidazole in 3 times within 30 minutes , keep the temperature at 115-120°C, react for 1.5-2.5 hours, the acid value is less than 12mgKOH / g, cool the mixture to below 90°C, add 432.0g of styrene, stir for 30 minutes, when the temperature of the mixture is lower than 50°C, add diethoxy 15 g of benzophenone and 5 g of diethyl 2,4,6-trimethylbenzoylphosphonate were stirred for 30 minutes to obtain a light yellow transparent liquid resin, which was stored in the dark.
[0049] Add above-mentioned light yellow transparent liquid resin 100g, calcium carbonate 30g, methylene bis(4-phenylisocyanate) 5.1g in the rea...
Embodiment 2
[0051] Put 190g bisphenol A type epoxy resin E20 and 200.0g methylol bisphenol A type epoxy resin CEQ-45 into the reactor, heat up to 105 ℃, stir evenly, add 2-tert-butyl hydroquinone 3.0 g, stir for 10 minutes, add 112.5g of methacrylic acid, control the temperature to stabilize to 90°C, slowly add 0.8g of benzyltriethylammonium chloride and 1.6g of 1-methylimidazole in 3 times within 30 minutes, keep the temperature for 115 -120℃, react for 1.5-2.5 hours, the acid value is less than 12mgKOH / g, cool the mixture to below 90℃, add 471.1g of styrene, stir for 30 minutes, when the temperature of the mixture is lower than 50℃, add 2-hydroxy-2- 18 g of methyl-1-phenylacetone and 3 g of 2,4,6-tritolylbenzoyldiphenylphosphine oxide were stirred for 30 minutes to obtain a light yellow transparent liquid resin, which was stored in the dark.
[0052] Add above-mentioned light yellow transparent liquid resin 100g, aluminum hydroxide 20g, methylene bis(4-phenyl isocyanate) 4.2g in the rea...
Embodiment 3
[0054] Put 241.6g of bisphenol A type epoxy resin E14 and 160g of methylol bisphenol A type epoxy resin Apogen101 into the reactor, heat up to 105 ° C, stir evenly, add 3.5g of di-tert-butyl-p-cresol, stir for 10 minutes, add 95.1g methacrylic acid, control the temperature to stabilize to 90°C, slowly add 0.9g benzyldimethylamine and 1.5g 2-phenyl-4-methyl-5-hydroxymethylimidazole in 3 times within 30 minutes g, keep the temperature at 115-120°C, react for 1.5-2.5 hours, the acid value is less than 12mgKOH / g, cool the mixture to below 90°C, add 480g of styrene, stir for 30 minutes, when the temperature of the mixture is lower than 50°C, add α-ammonia 15 g of alkyl phenone and 2.8 g of 2,4,6-trimethylphenylbenzoyldiphenylphosphine oxide were stirred for 30 minutes to obtain a light yellow transparent liquid resin, which was stored in the dark.
[0055] Add above-mentioned light yellow transparent liquid resin 100g, aluminum hydroxide 10g, methylene bis(4-phenyl isocyanate) 4.0g...
PUM
Property | Measurement | Unit |
---|---|---|
epoxy value | aaaaa | aaaaa |
heat deflection temperature | aaaaa | aaaaa |
viscosity | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com