Method for preparing ITO (Indium Tin Oxide) granulation powder by mixing method

Abstract

The invention relates to a method for preparing ITO (indium tin oxide) granulation powder by a mixing method. The method comprises the following steps: (1) weighing indium oxide and tin oxide powder for later use; (2) dissolving a dispersing agent and a binder in deionized water; (3) dispersing indium oxide and tin oxide powder into the solution obtained in the step (2); (4) putting the slurry into an ultrasonic instrument for pre-dispersion to obtain slurry to be ground; (5) putting the slurry to be ground into a ball mill for grinding; (6) adding a defoaming agent into the slurry, and stirring for defoaming; and (7) carrying out spray drying on the mixed slurry to obtain the ITO granulation powder. According to the method, by adding all materials and additives (the dispersing agent and the binder) at the same time, pre-dispersing the slurry under the combined action of ultrasonic treatment and stirring and putting the slurry into a grinding machine for sanding, the advantages that the grain size of the target material is small and uniform can be obtained through a mechanical mixing method, and the problem that good component uniformity and high activity are difficult to obtain atthe same time when ITO particles are prepared through a mixing method is solved.

Description

technical field [0001] The invention belongs to the technical field of indium tin oxide composite powder preparation, and relates to a method for preparing ITO granulated powder by a powder mixing method, in particular to a method for preparing ITO granulated powder with high uniformity and high activity. Background technique [0002] The ITO target is an important raw material for the preparation of ITO conductive glass. Usually, the ITO target is prepared into an ITO film by magnetron sputtering. Its performance is the key factor determining the quality, production efficiency and yield of conductive glass products. The quality of the ITO granulated powder is an important factor determining the performance of the ITO target, and the ITO granulated powder is required to have high purity, good activity, and uniformity. [0003] The main methods for preparing ITO powder include mechanical mixing method, spray pyrolysis method, sol-gel method, hydrothermal synthesis method, co-...

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Problems solved by technology

This method is more common in the world. The obtained powder has high sintering activity, small and uniform grain size, and is suitable for high-end TFT fields. However, there are certain problems: due to mechanical mixing, the mixing of indium oxide and tin oxide Uniformity is an important consideration factor. The uniformity of the two in the slurry determines the uniformity of the target. The usual method is to prolong the ball milling time, but too long milling will cause the dispersant to fail and agglomerate, and the surface of the powder particles Disadvantages such as reduced activity due to long-term mechanical friction

[0006] Chinese patent 201610400659.5 discloses a method for preparing high-performance ITO granulated powder, which still adopts the same feeding sequence as the existing mechanical mixing method in the preparation process, that is, first put indium oxide, tin oxide, and dispersant in the mixing tank Make a slurry, and then grind it to a certain size in a ball mill, then add a binder to grind for a period of time, after spray drying the first granulation, you need to add a dispersant for high-speed dispersion, and then carry out secondary granulation by spray drying. Although the activity of the powder is improved to a certain extent, the operation is complicated and needs to be carried out in different material barrels, and the material needs to be transferred multiple times, that is, the material needs to be transferred from the mixing tank to the ball mill, and from the ball mill to the spray drying device. The transfer of materials from the high-speed dispersing device to the spray drying device is very troublesome in actual operation, and the transfer of materials will actually waste a lot of time; and in different machines, the materials will definitely stick a lot inside, making it difficult to transfer cleanly. cause material waste

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