Circularly polarized light detector and preparation method thereof
A circularly polarized light and device technology, applied in the field of photodetection devices, can solve the problems of being unable to apply small integrated optical systems, etc., and achieve the effect of ultra-thin thickness and broad application prospects
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[0052] The preparation method of the circularly polarized light detection device based on monolayer molybdenum diselenide and chiral surface plasmon metasurface is further given below, and the preparation of the circularly polarized light detection device includes the following steps:
[0053]Step 1. Ultrasonic cleaning of the Si substrate with an organic solvent, ultrasonic cleaning in the order of acetone (10-15min) → ethanol (10-20min) → deionized water (10-20min), and finally use a nitrogen gun to clean the substrate The deionized water on the bottom was dried to obtain a clean Si substrate.
[0054] Step 2, on the Si substrate 1 obtained in the previous step, use the method of electron beam evaporation coating, and then plate the Ag reflective layer 2 and SiO 2 Dielectric layer 3, obtaining a Si substrate with a reflective layer and a dielectric layer. In order to obtain better film thickness and quality, the vacuum degree of the electron beam evaporation coating instrum...
Embodiment 1
[0061] A microscopic image of a circularly polarized light detection device based on monolayer molybdenum diselenide and chiral surface plasmon metasurface as shown in Figure 4 shown. Device structure such as figure 1 and figure 2 As shown, it includes Si substrate 1 , Ag reflective layer 2 , SiO2 dielectric layer 3 , monolayer molybdenum diselenide 4 , chiral surface plasmon metasurface 5 and electrode 6 from bottom to top. Among them, the Ag reflective layer 2 is located above the Si substrate 1, and the SiO 2 The dielectric layer 3 is located above the Ag reflective layer 2, and the single-layer molybdenum disulphide selenide 4 after wet transfer is located on SiO 2 On the dielectric layer 3 , a chiral surface plasmon metasurface 5 generated by electron beam exposure is located on a monolayer of molybdenum diselenide 4 . The constituent material of the chiral surface plasmon metasurface 5 is gold, and its constituent unit is an asymmetric "η"-shaped nanostructure, su...
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