Copper-reducing micro-etching agent and preparation method thereof
A technology of micro-etching agent and corrosion inhibitor, which is applied to the removal of conductive materials by chemical/electrolytic methods, the manufacture of printed circuits, and printed circuits. The effect of slowing down the speed and maintaining the complete shape
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Embodiment 1-13
[0040] Examples 1-13 and Comparative Examples 1-13 respectively provide a copper-reducing microetch agent and a preparation method of the copper-reducing microetch agent. The copper microcorrosion agent of each embodiment and comparative example, solvent is pure water, and in the volume of 1L, the content of solute is as shown in table 1, and wherein, stabilizing agent is p-hydroxybenzenesulfonic acid, and corrosion inhibitor is polyethylene sulfonic acid. Amine, N-containing heterocyclic compound is 1-hydroxyethyl-2-oleyl imidazoline.
[0041] The content (g) of solute in the copper-reducing microetch agent of every 1L volume of table 1
[0042] h 2 SO 4
Embodiment 14
[0044] This comparative example is compared with Example 5, and the difference is that the N-containing heterocyclic compound used in this comparative example is 2-methylimidazole, that is, the 1-hydroxyethyl group in Example 5 is replaced by 2-methylimidazole -2-oleyl imidazoline, all the other components are completely consistent with that of Example 5, and the preparation method is also the same as that of Example 5.
Embodiment 15
[0046] This comparative example is compared with Example 5, and the difference is that the N-containing heterocyclic compound used in this comparative example is benzotriazole, that is, the 1-hydroxyethyl group in Example 5 is replaced by benzotriazole -2-oleyl imidazoline, all the other components are completely consistent with that of Example 5, and the preparation method is also the same as that of Example 5.
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