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Silicon-containing sulfuric acid ester salt

A technology of sulfate ester salt and sulfate ester, which is applied in the direction of organic chemistry, organic electrolyte, silicon organic compound, etc., to achieve the effect of small environmental load and electrochemical stability

Active Publication Date: 2018-12-21
NISSHINBO IND INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the above-mentioned electrolyte salt still has problems in terms of environmental load due to containing halogen atoms such as fluorine atoms in the anion, and improvement is desired.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0107] [Example 1] Synthesis of Silicon-Containing Sulfate Salt 1

[0108] [chemical 10]

[0109]

[0110] 1.0 equivalent of trimethylsilylpropane (manufactured by Sigma-Aldrich), 1.1 equivalent of sulfamic acid (manufactured by Wako Pure Chemical Industries, Ltd.), and 0.2 equivalent of urea (manufactured by Wako Pure Chemical Industries, Ltd.) were placed in a nitrogen atmosphere Mix under pressure and heat to 150°C while stirring. After reaching 150°C, continue stirring and heating for 6 hours, and then allow to cool to room temperature. Ethyl acetate (manufactured by Wako Pure Chemical Industries, Ltd.) was added until the obtained solid was completely immersed, and the solid was pulverized with a spoon or the like, and stirred for about 1 hour, and then the solid was separated by filtration under reduced pressure. its dry. Compound A (yield: 79%) was obtained as the target compound in a state containing some urea.

[0111] [chemical 11]

[0112]

[0113] 1.0 eq...

Embodiment 2

[0114] [Example 2] Synthesis of silicon-containing sulfate ester salt 2

[0115] [chemical 12]

[0116]

[0117] In the same manner as in Example 1, a colorless Silicon-containing sulfate ester salt 2 as a transparent liquid (91% yield). will contain the sulfate salt of silicon 2 1 H-NMR figure (solvent: heavy chloroform) is shown in Figure 4 , plotting the DSC in the Figure 5 , plotting the TG-DTA in Image 6 .

[0118] Table 1 shows the melting point and decomposition point (10% weight loss, under air) of silicon-containing sulfate ester salts 1 to 2 determined by DSC and TG-DTA measurement.

[0119] [Table 1]

[0120]

Embodiment 3、4

[0121] [Example 3, 4] Measurement of Potential Window

[0122] Cyclic voltammetry measurements were performed on silicon-containing sulfate ester salt 1 (Example 3) and silicon-containing sulfate ester salt 2 (Example 4). show the result in Figure 7 (Example 3) and Figure 8 (Example 4). As is clear from these figures, the silicon-containing sulfate ester salt of the present invention has a wide potential window and excellent electrochemical stability.

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Abstract

Provided is a silicon-containing sulfuric acid ester salt comprising a silicon-containing sulfuric acid ester anion represented by formula (1) and a cation selected from cations respectively represented by formulae (2) to (5).

Description

technical field [0001] The present invention relates to sulfate ester salts containing silicon. Background technique [0002] In recent years, the popularity of portable electronic devices such as digital cameras, smart phones, and tablet devices has been astonishing. Along with this, the demand for power storage devices such as secondary batteries that can be used repeatedly by charging and used as power sources for these devices has increased significantly, and The demand for higher capacity and higher energy density is constantly increasing. [0003] In these electrical storage devices, generally, a solution obtained by dissolving an electrolyte salt in an aprotic organic solvent is used as an electrolyte solution. Various studies have been conducted so far on combinations of these electrolyte salts and aprotic organic solvents. As electrolyte salts, quaternary ammonium salts (Patent Documents 1 to 3), quaternary phosphonium salts (Patent Document 4) and the like are co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07F7/08C07F9/54
CPCC07F7/081C07F9/5407Y02E60/10C07C211/63C07F7/08C07F9/54H01G11/62H01M10/0567H01M2300/0025
Inventor 增田现
Owner NISSHINBO IND INC
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