A bipolar power semiconductor device and a preparation method thereof
A technology of power devices and semiconductors, applied in the field of bipolar semiconductor power devices and their preparation, can solve the problems of raising the overall power consumption and increasing the use cost of the devices, etc.
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Embodiment 1
[0088] This embodiment provides a MOS control anode IGBT device, and its cell structure is as figure 2 As shown, a bipolar semiconductor power device with a MOS controlled anode includes an anode structure, a drift region structure, a cathode structure, and a control gate structure; the anode structure includes a P-type anode region 109 and a lower surface of the P-type anode region 109 The anode metal 110; the drift region structure includes an N + field stop layer 108 and an N-type drift region 107 located on the upper surface of the N + field stop layer 108, the N-type drift region 107 is located on the upper surface of the P-type anode region 109; The cathode structure includes a P-type body region 106, a P+ emitter region 105, an N+ emitter region 104, and a cathode metal 101. The P+ emitter region 105 and N+ emitter region 104 are located on the top layer of the P-type body region 106, and the upper surfaces of the two are connected to the cathode metal. 101 is in contact...
Embodiment 2
[0091] This embodiment provides a MOS control anode IGBT device, and its cell structure is as image 3 As shown, the difference from Embodiment 1 is that the thickness of the second anode trench gate dielectric layer 114 in the anode trench gate structure is greater than the thickness of the first anode trench gate dielectric layer 113, specifically, the second anode trench gate The thickness of the dielectric layer 114 is about The thickness of the first anode trench gate dielectric layer 113 is about The purpose of this design is to control the turn-on voltage of the anode trench gate while reducing the parasitic capacitance of the anode trench gate electrode, thereby reducing the adverse effect of the parasitic parameters of the anode MOS structure on the IGBT device parameters.
Embodiment 3
[0093] This embodiment provides a MOS control anode IGBT device, and its cell structure is as Figure 4 As shown, the difference from Embodiment 1 is that the N+ source region 112 in the anode MOS structure is removed and replaced with a P-type base region 111. Since the concentration of the P-type base region 111 is lower than that of the P-type anode region 109, the anode trench gate controls the side channel inversion when the device is working, thereby achieving the effect of bypassing the anode diode. At this time, the P-type anode region 109 forms an ohmic contact with the anode metal 110, and the P-type base region 111 forms a Schottky contact with the anode metal 110.
[0094] When the device is working, the Schottky junction formed by the anode metal 110 and the P-base region 111 is reverse biased. When the control gate structure forms a conductive channel, the carriers passing through the control gate structure channel are reversed in the Schottky junction. The partial ...
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