Grinding fluid for optical sapphire

Abstract

The invention discloses a grinding fluid for optical sapphire, belonging to the technical field of grinding and polishing. The grinding fluid comprises the following raw materials by weight: 4-7 partsof fine boron nitride powder, 5-9 parts of fine quartz sand powder, 3-6 parts of stearic acid, 4-7 parts of ethylene glycol, 2-5 parts of sodium lignosulfonate, 5-9 parts of montmorillonite, 2-4 parts of sodium hydroxide, 5-10 parts of polyethylene glycol, 2-4 parts of a lubricant, 5-10 parts of a nonionic surfactant, 3-7 parts of sodium gluconate, 5-8 parts of sodium silicate and 30-40 parts ofwater. The grinding fluid of the invention has high polishing efficiency and high precision; workpieces treated with the grinding fluid are small in surface scratch loss and have smooth surfaces; andwhen the grinding fluid is used for grinding and polishing of optical sapphire, a sapphire sheet is allowed to have flatness of 0.1 nm, so good conditions are provided for subsequent precision polishing.

Description

technical field [0001] The invention relates to the technical field of grinding and polishing, in particular to a grinding liquid for optical sapphire. Background technique [0002] Sapphire, commonly known as corundum, has excellent mechanical, optical, chemical and electrical properties, and can withstand high temperature and radiation. It is widely used in wear-resistant devices, optical windows, substrate materials, missile fairings and other fields. The widespread application of optical sapphire puts forward higher requirements for its ultra-smooth and non-damaging surface processing. Grinding is a key process for optical sapphire materials to obtain good flatness and curvature, as well as surface roughness, to ensure polishing quality and efficiency. [0003] The surface grinding and polishing of sapphire currently on the market generally uses alumina, zirconia, diamond, silicon oxide, titanium oxide, silicon nitride, etc., but in practical applications, the particle ...

AI Technical Summary

Problems solved by technology

[0003] The surface grinding and polishing of sapphire currently on the market generally uses alumina, zirconia, diamond, silicon oxide, titanium oxide, silicon nitride, etc., but in practical applications, the particle size of the existing particles is small and the surface High activity, strong interaction between particles, the dispersed nanoparticles are prone to agglomeration, which affects the performance of the polishing liquid composition; at the same time, the grinding particles such as nano-diamond, aluminum oxide, zirconia, silicon nitride, etc., have uniform hardness. Larger, the damage to the surface during the polishing process is more serious, not only resulting in greater surface roughness, but also prone to surface defects such as polishing scratches and pits; at the same time, the polishing rate of materials such as silicon oxide with better dispersion and stability And low, can not meet the requirements of the existing technology