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Method for preparing two-dimensional indium trisulfide mono-crystals on mica substrate

A technology of indium trisulfide and a substrate is applied in the field of preparing two-dimensional indium trisulfide single crystal, which can solve the problems of many crystal defects, short growth time, small crystal size and the like, and achieves simple preparation process, short growth time, Equipment simple effect

Inactive Publication Date: 2018-09-14
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the production cost of this method is low, the prepared diindium trisulfide is three-dimensional, and most of them are polycrystalline or amorphous, and there are many crystal defects, which is not conducive to the further improvement of performance.
There are also researchers who have grown two-dimensional indium trisulfide by chemical vapor deposition, but its crystal size is small, which is not conducive to the further application of materials.
At present, no large-scale two-dimensional indium trisulfide single crystal material has been successfully grown at home and abroad, but the crystal size of two-dimensional indium trisulfide directly prepared by physical vapor deposition can reach more than 80 microns, plus The process is simple, the growth time is short, and the crystallization is good, which will be beneficial to the improvement of all aspects of performance

Method used

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  • Method for preparing two-dimensional indium trisulfide mono-crystals on mica substrate
  • Method for preparing two-dimensional indium trisulfide mono-crystals on mica substrate
  • Method for preparing two-dimensional indium trisulfide mono-crystals on mica substrate

Examples

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Effect test

example 1

[0033] Put the mica sheet into acetone, absolute ethanol, and deionized water for 5 minutes, then rinse it with deionized water several times, and finally dry it quickly with nitrogen. Weigh 10 mg of indium trisulfide powder with an electronic balance, put the powder on a clean quartz boat, place the cleaned mica sheet on the top of the quartz boat containing indium trisulfide, and then place the indium trisulfide quartz boat Place it in the middle of the tube furnace; fully open the inlet and outlet valves of the tube furnace, open the argon bottle, adjust the gas flow meter to 600 sccm, and feed a large amount of argon into the quartz tube of the tube furnace for 10 minutes. Turn on the tube furnace, raise it from room temperature to 980 degrees within 20 minutes, reduce the air flow to 20 sccm at about 500 degrees, keep it at 980 degrees for 5 minutes, take out the sample after natural cooling, and obtain diindium trisulfide single crystal.

example 2

[0035] Put the mica sheet into acetone, absolute ethanol, and deionized water for 10 minutes, then rinse it with deionized water several times, and finally dry it quickly with nitrogen. Weigh 20 mg of indium trisulfide powder with an electronic balance, put the powder on a clean quartz boat, place the cleaned mica sheet on the top of the quartz boat containing indium trisulfide, and then place the indium trisulfide quartz boat Place it in the middle of the tube furnace; fully open the inlet and outlet valves of the tube furnace, open the argon bottle, adjust the gas flow meter to 600 sccm, and feed a large amount of argon into the quartz tube of the tube furnace for 10 minutes. Turn on the tube furnace, rise from room temperature to 980 degrees within 30 minutes, reduce the air flow to 20 sccm at about 500 degrees, keep it at 980 degrees for 10 minutes, take out the sample after natural cooling, and obtain diindium trisulfide single crystal.

example 3

[0037] Put the mica sheet into acetone, absolute ethanol, and deionized water for 30 minutes, then rinse it with deionized water several times, and finally dry it quickly with nitrogen. Weigh 30mg of indium trisulfide powder with an electronic balance, put the powder on a clean quartz boat, place the cleaned mica sheet on the top of the quartz boat containing indium trisulfide, and then put the indium trisulfide in the quartz boat Place it in the middle of the tube furnace; fully open the inlet and outlet valves of the tube furnace, open the argon bottle, adjust the gas flow meter to 600 sccm, and feed a large amount of argon into the quartz tube of the tube furnace for 10 minutes. Turn on the tube furnace, rise from room temperature to 980 degrees within 30 minutes, reduce the airflow to 20 sccm at about 500 degrees, keep it at 980 degrees for 15 minutes, take out the sample after natural cooling, and obtain diindium trisulfide single crystal.

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Abstract

The invention discloses a method for preparing two-dimensional indium trisulfide mono-crystals on a mica substrate. The method comprises the following steps: S1; washing a mica sheet; S2: preparing materials: weighing 10 to 15mg of indium trisulfide powder; putting indium trisulfide powder on a clean quartz boat; flatly placing the washed mica sheet on the quartz boat; then putting the quartz boatin a tubular furnace; S3: controlling gas flow: completely switching on a gas inlet valve and a gas outlet valve of the tubular furnace; opening an argon gas bottle and adjusting the gas flow mount of a gas flow meter to 500 to 600sccm; introducing argon gas into a quartz pipe of the tubular furnace for 10 to 30min to discharge all air impurities; S4: heating and growing: opening the tubular furnace and raising the temperature to 980 DEG C within 20min; after keeping heat at 980 DEG C for 5 to 10min, naturally cooling to obtain the two-dimensional indium trisulfide mono-crystals. The method disclosed by the invention has the advantages of simple needed equipment and preparation technology, short growth time, capability of directly obtaining two-dimensional indium trisulfide with good crystallization degree relatively high purity and relatively large size and the like.

Description

technical field [0001] The invention relates to the fields of two-dimensional semiconductor single crystal material preparation technology and device preparation technology, in particular to a method for preparing a two-dimensional indium trisulfide single crystal on a mica substrate. Background technique [0002] Physical vapor deposition method: using physical methods, the material source—solid or liquid surface is vaporized into gaseous atoms, molecules or parts are ionized into ions, and a film with a special function is deposited on the surface of the substrate. [0003] There are three different crystal structures of In2S3: α-In2S3, β-In2S3 and γ-In2S3. Among them, β-In2S3 is an n-type semiconductor with a band gap of 1.9-2.3eV, which is stable at room temperature. Most importantly, due to the mismatch between In and S atoms, β-In2S3 is a typical natural defect crystal with trapping level or intermediate band (IB) in the bandgap, which leads to interesting optical, el...

Claims

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Application Information

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IPC IPC(8): C30B23/00C30B29/46C30B29/64
CPCC30B23/00C30B29/46C30B29/64
Inventor 招瑜陆健婷李京波
Owner GUANGDONG UNIV OF TECH
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