Method for analyzing influence of beta-SiC transition layer on nucleation and growth of diamond film
A diamond film, diamond thin film technology, used in the analysis of materials, material excitation analysis, material analysis using wave/particle radiation, etc.
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[0035] In this embodiment, an intermediate frequency magnetron sputtering is used to deposit a SiC transition layer on a cemented carbide YG 8 (WC-Co 8%) substrate. By controlling the sputtering power of Si target (99.99%) and acetylene (C 2 h 2 ) gas flow to realize the reaction of Si element and C element. By adjusting the deposition temperature, β-SiC transition layers with different surface morphology and tissue characteristics were obtained. In this embodiment, SEM, XRD and Raman spectroscopy are used to study the influence of deposition temperature on the surface morphology and organizational characteristics of the magnetron sputtered β-SiC transition layer, and to explore the impact of low-temperature deposition on the surface morphology and organizational characteristics of the β-SiC transition layer on the morphology of diamond films. The influence of nucleation and growth, and the mechanism of β-SiC transition layer affecting diamond nucleation and growth. Include...
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