Polishing solution

Abstract

The invention discloses a polishing solution. The specific steps are as follows: put calcium oxide and silicon dioxide powders with a mass ratio of 1:1.3 into a graphite crucible, fully mix them, then heat to 1600-1650°C, and then keep warm 40-50min to obtain the reaction product of calcium oxide and silicon dioxide; the obtained reaction product of calcium oxide and silicon dioxide is subjected to water quenching treatment to obtain water-quenched calcium silicate; the obtained water-quenched calcium silicate is dried and pulverized 1. After sieving, take the sieved material to obtain water-quenched calcium silicate powder, and grind it into 100-120 mesh powder; prepare a certain concentration of sulfuric acid solution, slowly add the obtained water-quenched calcium silicate powder under stirring conditions, The mass ratio of the water-quenched calcium silicate to sulfuric acid is 1:1.2-1.4. After the reaction is completed, it is suction-filtered, and the separated colorless and transparent filtrate is high-purity silica sol. The advantages of the present invention are: the present invention reacts the water-quenched calcium silicate obtained by high-temperature water-quenching with sulfuric acid to prepare silica sol, not only does the product contain no metal ions, but the impurity content is very small.

Description

technical field [0001] The invention belongs to the technical field of chemical material preparation, and in particular relates to a polishing liquid. Background technique [0002] With the progress of society and the development of science and technology, stainless steel metal products are more and more widely used in various fields of industry, agriculture and people's life, and at the same time, they have created more and more value for society. In recent years, a thin stainless steel substrate has been preferred as the ideal flexible display substrate due to its many advantages, such as light weight, rollability, high temperature resistance, radiation resistance, water and oxygen resistance, low manufacturing cost and easy acquisition. Materials, however, the flat panel display industry has extremely high requirements on the surface roughness of stainless steel substrates, and the stainless steel substrates need to be fully polished. [0003] At present, the methods of ...

AI Technical Summary

Problems solved by technology

Among these methods, the cost of mechanical polishing is high, and the high cost lies in the equipment required for high-temperature pickling and mechanical polishing, its auxiliary materials and power consumption; although electrochemical polishing has a better polishing effect, the cost is relatively high, and it is easily limited by the distribution of power lines. , affect the color; the cost of chemical polishing is low, the polishing is comprehensive, and the mirror surface is bright after polishing, but the polishing effect is different due to the different formulations of the chemical polishing liquid used; the polishing treatment of stainless steel substrates used in the flat panel display industry requires both Low operating cost, but also requires excellent smoothing and brightening effects after polishing