Preparation method of heterogeneous Ge-based pin diode string in reconfigurable multilayer holographic antenna
A technology of diode strings and holographic antennas, applied in antennas, radiation element structures, semiconductor/solid-state device manufacturing, etc., can solve the problems of low carrier mobility, large injection dose and energy, and low integration High carrier mobility, improved breakdown voltage, and improved device performance
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Embodiment 1
[0062] The embodiment of the present invention provides a method for preparing a heterogeneous Ge-based pin diode string in a reconfigurable multilayer holographic antenna, and the heterogeneous Ge-based plasma pin diode string is used to manufacture a reconfigurable multilayer holographic antenna (1), Please refer to figure 1 , figure 1 This is a schematic structural diagram of a reconfigurable multilayer holographic antenna provided by an embodiment of the present invention; the holographic antenna (1) includes: a semiconductor substrate (11), an antenna module (13), and a first holographic ring (15) And a second holographic ring (17); the antenna module (13), the first holographic ring (15), and the second holographic ring (17) are all fabricated on the semiconductor substrate using a semiconductor process (11) Top; wherein, the antenna module (13), the first holographic ring (15) and the second holographic ring (17) all include pin diode strings connected in series;
[0063] ...
Embodiment 2
[0116] See Figure 8a-Figure 8r , Figure 8a-Figure 8r It is a schematic diagram of another manufacturing method of a heterogeneous Ge-based pin diode for a reconfigurable multilayer holographic antenna provided by an embodiment of the present invention. On the basis of the first embodiment above, a GeOI-based solid-state plasma pin diode with a channel length of 22 nm (the length of the solid plasma region is 100 microns) is taken as an example for detailed description. The specific steps are as follows:
[0117] Step 1, preparation steps of substrate material:
[0118] (1a) such as Figure 8a As shown, the (100) crystal orientation is selected, the doping type is p-type, and the GeOI substrate 101 with a doping concentration of 1014cm-3, and the thickness of the top layer Ge is 50μm;
[0119] (1b) such as Figure 8b As shown, a first SiO2 layer 201 with a thickness of 40 nm is deposited on a GeOI substrate by using a chemical vapor deposition (CVD) method;
[0120] (1c) Using a chem...
Embodiment 3
[0147] Please refer to Picture 9 , Picture 9 It is a schematic diagram of another device structure of a heterogeneous Ge-based plasma pin diode provided by an embodiment of the present invention. The heterogeneous Ge-based plasma pin diode adopts the above-mentioned figure 2 The manufacturing method shown is produced. Specifically, the Ge-based plasma pin diode is prepared and formed on the GeOI substrate 301, and the P region 304, the N region 305 and the P region 304 and the N region 305 of the pin diode are laterally located between the P region 304 and the N region 305 The intermediate I regions are all located in the top Ge302 of the GeOI substrate. The pin diode can be isolated by STI deep trench isolation, that is, an isolation trench 303 is provided outside the P region 304 and the N region 305, and the depth of the isolation trench 303 is greater than or equal to the thickness of the top layer Ge302.
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