Hole metallizing method for circuit board with high ratio of thickness to radial dimension
A high aspect ratio, hole metallization technology, applied in the direction of electrical connection formation of printed components, can solve the problems of high production cost, low current, large investment, etc., to avoid material waste, improve electroplating current density, and smooth surface. Effect
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Embodiment 1
[0025] This embodiment provides a hole metallization method for a circuit board with a high aspect ratio, including the following steps:
[0026] S1. Perform magnetron sputtering plating on the circuit board after controlled depth drilling, back drilling, grinding and deburring;
[0027] S2, hole filling electroplating, plating a thick copper layer in the back-drilled hole after electroless copper deposition in step S1;
[0028] S3. Paste the dry film on the surface of the circuit board, make the outer layer graphics, and perform graphic electroplating, form a protective tin layer on the surface of the circuit board and the back drilling, and then remove the dry film on the surface of the board;
[0029] S4, making a hole-masking dry film on the surface of the circuit board;
[0030] S5, chemically etching the circuit board, removing the hole-masking dry film, and removing the protective tin layer.
[0031] The step S4 also includes the step of making a hole-masking film bef...
Embodiment 2
[0042] This embodiment provides a hole metallization method for a circuit board with a high aspect ratio, including the following steps:
[0043] S1. Perform magnetron sputtering plating on the circuit board after controlled depth drilling, back drilling, grinding and deburring;
[0044] S2, hole filling electroplating, plating a thick copper layer in the back-drilled hole after electroless copper deposition in step S1;
[0045] S3. Paste the dry film on the surface of the circuit board, make the outer layer graphics, and perform graphic electroplating, form a protective tin layer on the surface of the circuit board and the back drilling, and then remove the dry film on the surface of the board;
[0046] S4, making a hole-masking dry film on the surface of the circuit board;
[0047] S5, chemically etching the circuit board, removing the hole-masking dry film, and removing the protective tin layer.
[0048] The step S4 also includes the step of making a hole-masking film bef...
Embodiment 3
[0058] This embodiment provides a hole metallization method for a circuit board with a high aspect ratio, including the following steps:
[0059] S1. Perform magnetron sputtering plating on the circuit board after controlled depth drilling, back drilling, grinding and deburring;
[0060] S2, hole filling electroplating, plating a thick copper layer in the back-drilled hole after electroless copper deposition in step S1;
[0061] S3. Paste the dry film on the surface of the circuit board, make the outer layer graphics, and perform graphic electroplating, form a protective tin layer on the surface of the circuit board and the back drilling, and then remove the dry film on the surface of the board;
[0062] S4, making a hole-masking dry film on the surface of the circuit board;
[0063] S5, chemically etching the circuit board, removing the hole-masking dry film, and removing the protective tin layer.
[0064] The step S4 also includes the step of making a hole-masking film bef...
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