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A kind of electrolytic decopper accelerator suitable for electroplating rhodium solution

An accelerator and solution technology, applied in the field of electrolytic copper removal accelerator and electroplating, can solve the problems of long time, affecting production, high cost of copper removal purification tank, and achieve the effect of reducing consumption

Active Publication Date: 2013-06-12
BEIJING XINGHANG MECHANICAL ELECTRICAL EQUIP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The price of precious metal rhodium is more than 10 times of gold price, causes the cost of removing copper and purifying bath solution to be extremely high, and needs a long time
Electrolysis, affecting production

Method used

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Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach

A kind of electrolytic decopper promotor that is applicable to electroplating rhodium solution, this promotor is composed of main promotor and auxiliary promotor group

become.

Described main promotor is any one in 1,3,6-naphthalenesulfonic acid, p-toluenesulfonamide, saccharin, thiophene-2-sulfonic acid

kind. Their common feature is that they are all compounds with =C-SO2-structure.

Described co-accelerator is any of following aldehydes, ketones, alkyne three types of compounds; Said aldehydes

compound is any one of formaldehyde, chloral hydrate, o-sulfobenzaldehyde; said ketone compound refers to coumarin, o-hydroxy

Any one of base cinnamic acid and diethylmaleate; said alkyne compound refers to 1,4-butynediol, dimethylamine

Any of propyne and propargyl aldehyde.

[0016] The consumption of main accelerator in plating solution is to add 0.001g~0.1g per liter of bath solution.

[0017] The consumption of auxiliary accelerator in plating solution is to add 0.1g~0.8g p...

Embodiment 1

[0019] The main accelerator is: 1,3,6-naphthalenesulfonic acid, every liter of bath solution adds 0.001g~0.1g.

[0022] Step 1

[0024] When the 1,3,6-naphthalenesulfonic acid added in every liter of plating solution is lower than 0.001g, its promoting effect will not be evident.

[0037] The rhodium plating bath is filtered. The filtered rhodium plating bath can be reused.

Embodiment 2

[0040] The main accelerator is: 1,3,6-naphthalenesulfonic acid, adding 0.001g~0.1g per liter of tank solution.

[0041] Auxiliary accelerator is: formaldehyde, every liter of bath solution adds 0.1g~0.8g.

Concrete implementation steps are:

Step 1

Add 1,3,6-naphthalenesulfonic acid 0.001g~0.1g in every liter of polluted electroplating rhodium solution, stir electroplating rhodium solution.

[0045] When the 1,3,6-naphthalenesulfonic acid added in every liter of plating solution is lower than 0.001g, its promoting effect will not be evident.

When adding in every liter of plating solution, be greater than 1,3,6-naphthalenesulfonic acid 0.1g, 1,3,6-naphthalenesulfonic acid content is excessive, excessive 1,

3,6-Naphthalenesulfonic acid cannot be removed by activated carbon adsorption, and it needs to be electrolytically decomposed by electrification before it can be removed by activated carbon adsorption. power ups

The cathode current density is 0.02A / dm when the cathode c...

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Abstract

The invention belongs to the technical field of electroplating, and is a kind of accelerator for electrolytic copper removal suitable for electroplating rhodium solution. The accelerator is composed of a main accelerator and an auxiliary accelerator. The main accelerator is 1,3,6-naphthalenesulfonic acid, Any one of toluenesulfonamide, saccharin, and thiophene-2-sulfonic acid, their common feature is that they are all compounds with =C-SO2-structure; the co-promoters are the following three types of aldehydes, ketones, and alkynes Any of type compounds; advantages of the present invention: this technology greatly reduces the consumption of rhodium in the process of electrolytic copper removal by adding the accelerator developed in the rhodium plating solution polluted by copper ions. Under the same electrolysis conditions, the copper precipitation efficiency is increased by about 105 times, and the rhodium precipitation is reduced by about 100 times, which greatly reduces the consumption of precious metal rhodium in the process of purifying the bath solution.

Description

A kind of electrolytic copper accelerator suitable for electroplating rhodium solution Technical field The invention belongs to electroplating technical field, relate to a kind of electrolytic decopper promoter applicable to electroplating rhodium solution, adapt to In electroplating precious metal rhodium baths, it is common to cause blackening of the rhodium coating due to copper ion pollution, which must be electrolyzed by low current density The case of removing copper impurities. Background technique [0002] In the rhodium plating solution, the common bath is polluted by copper ions, causing the coating to turn black. In order to remove copper ions in the bath, A common method is to use a low current density electrolysis method, that is, to use a Waller electrolytic plate to connect the electroplating cathode, through a long time small Current electrolysis, so that copper ions are electrolyzed on the Waller plate. The shortcoming of this method is that a large am...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D3/52C25C1/20
Inventor 汤宏才
Owner BEIJING XINGHANG MECHANICAL ELECTRICAL EQUIP
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