Preparation method of crystalline silicon solar cell textured structure
A technology of solar cells and crystalline silicon, applied in the field of solar cells, can solve the problems of complex process and unfavorable industrial production, and achieve the effects of simple operation process, improving open circuit voltage and cell conversion efficiency, and ensuring stability
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[0037] A method for preparing a textured structure of a crystalline silicon solar cell, comprising the steps of:
[0038] (1) Put the silicon wafer into a hydrofluoric acid solution containing an oxidizing agent and a metal salt to form a porous layer structure; the temperature is 50°C, and the time is 10-1000s;
[0039] (2) washing with water;
[0040] Then use the first chemical etching solution to etch the surface, the temperature is 40°C, and the time is 5-250s; the first chemical etching solution is a mixed solution of hydrofluoric acid and nitric acid;
[0041] The concentration of hydrofluoric acid is 1mol / L, the concentration of nitric acid is 8mol / L, and the molar ratio of hydrofluoric acid and nitric acid is 1:1;
[0042] (3) washing with water;
[0043] Then using the first cleaning solution to remove residual metal particles;
[0044] The first cleaning solution is selected from a mixture of ammonia and hydrogen peroxide;
[0045] (4) washing with water;
[00...
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