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An immersion lithography machine immersion liquid flow field maintenance anti-collision system

A lithography machine and immersion technology, which is applied in the field of immersion lithography machine immersion liquid flow field maintenance anti-collision system, can solve the problems of negative exposure quality and impact, and achieve the effects of reducing impact, avoiding collision, and improving spacing

Active Publication Date: 2018-05-04
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the high-speed movement of the substrate, once the external air or sealing liquid is involved or dissolved or diffused into the filling liquid, it will have a negative impact on the exposure quality

Method used

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  • An immersion lithography machine immersion liquid flow field maintenance anti-collision system
  • An immersion lithography machine immersion liquid flow field maintenance anti-collision system
  • An immersion lithography machine immersion liquid flow field maintenance anti-collision system

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Embodiment Construction

[0032] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0033] The purpose of the present invention is to provide an immersion liquid flow field maintenance system for an immersion photolithography machine. In the gap between the existing liquid supply system and the wafer stage, a buffer telescopic device is added, and the buffer telescopic device can freely Move in the direction of the optical axis or rotate about at least one axis perpendicular to the optical axis.

[0034] figure 1 It is a schematic structural diagram of an existing photolithography machine, which reveals a structure of an existing photolithography machine. In the lithography machine, the main frame supports an illumination system 20 , a projection objective lens 10 and a silicon wafer stage 40 on which a silicon wafer 50 coated with photosensitive photoresist is placed. The pattern of the integrated circuit on the reticle 30...

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Abstract

The invention discloses an immersion liquid flow field maintenance anti-collision system for an immersion photolithography machine, which is characterized in that it includes: a liquid supply device for providing liquid between a projection objective lens and a base table; a base located on the base table and immersed in the liquid; a buffer telescopic device, the buffer telescopic device is located between the liquid supply device and the base, is used to realize the sealing of the liquid, and can move in the direction of the optical axis.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to an immersion liquid flow field maintenance anti-collision system for an immersion photolithography machine. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. The modern lithography machine is mainly based on optical lithography. It uses the optical system to accurately project and expose the pattern on the mask to the silicon coated with photoresist. a. It consists of a laser light source, an optical system, a projection reticle consisting of chip patterns, an alignment system and a silicon wafer coated with photosensitive photoresist [0003] Immersion Lithography (Immersion Lithography) equipment fills a liquid with a high refractive index between the last projection objective lens and the silicon wafer, which improves the numerical aperture of the projection objective lens ( NA), thereby improv...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 秦少伍聂宏飞
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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