Titanium nitride chromium coating and double glow plasma seepage preparing method thereof
A technology of titanium chromium nitride coating and double-layer glow, which is applied in the field of ion infiltration preparation, can solve the problems of poor bonding force of the film base, low friction coefficient, environmental pollution, etc., and achieve easy operation, high hardness, and controllability strong effect
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Embodiment 1
[0020] The titanium and chromium wires of different diameters are wound on the circumference of the barrel-shaped cathode, with an interval of 10mm up and down, left and right, to form a source for supplying titanium and chromium to be infiltrated. The mass ratio of titanium and chromium wires is 100:50. Place the polished low-carbon steel sample in the middle of the barrel-shaped cathode, with a distance of 12 mm from the tip of the filamentary source, and vacuumize to 3.0×10 -2 Pa, the argon gas with a purity of 99.999% is introduced, and the air pressure is 30Pa. Voltages of 960V and 400V are respectively applied to the cathode and the source to sputter titanium and chromium atoms, and the low carbon steel sample is also heated to At 1000°C, titanium, chromium ions, atoms and particles reach the surface of the sample and are adsorbed, and the alloying element titanium chromium is infiltrated by the diffusion process. After the titanium chromium infiltration is kept for 1.0 h...
Embodiment 2
[0022] The preparation operation of titanium chromium nitride coating is the same as embodiment 1. In the process of titanizing and chromizing, the distance between titanium and chromium plates is 15mm, the cathode voltage is 650V, the temperature is 1200°C, the holding time is 0.5 hours, and the mass ratio of titanium wire and chromium wire is 100:10; The volume ratio of gas and nitrogen is 1:5.0, the pressure of the mixed gas is 50Pa, the reaction time is 1.5 hours, the reaction temperature is 1200°C, and the cooling time is 8 hours.
Embodiment 3
[0024] The preparation operation of titanium chromium nitride coating is the same as embodiment 1. In the process of titanizing and chromizing, the distance between titanium and chromium plates is 13 mm, the cathode voltage is 550 V, the temperature is 1050 ° C, the holding time is 1.5 hours, and the mass ratio of titanium wire and chromium wire is 100:40; during nitriding reaction plating, argon The volume ratio of gas and nitrogen is 1:1.0, the pressure of the mixed gas is 40Pa, the reaction time is 4.5 hours, the reaction temperature is 1050°C, and the cooling time is 6 hours.
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