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Surface modification method for implant tooth nail by plasma immersion ion implantation technology

A technology of immersion ion implantation and plasma, which is applied in ion implantation plating, metal material coating process, vacuum evaporation plating, etc., can solve the problem of unsatisfactory biological activity, osteogenic activity and antibacterial performance on the surface of implanted dental nails. Poor combination of human tissue and weak osseointegration ability of implant materials, etc., to achieve the effect of improving biological activity and antibacterial performance, improving corrosion resistance and good controllability

Active Publication Date: 2015-09-16
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in terms of denture implantation, there is such a problem: because the surface bioactivity, osteogenic activity and antibacterial properties of implanted dental screws are not ideal enough, resulting in weak osseointegration ability of implant materials and poor integration with human tissues

Method used

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  • Surface modification method for implant tooth nail by plasma immersion ion implantation technology
  • Surface modification method for implant tooth nail by plasma immersion ion implantation technology
  • Surface modification method for implant tooth nail by plasma immersion ion implantation technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] The dental implant nails treated with sandblasting acid were ultrasonically cleaned and then dried naturally for use. Plasma immersion ion implantation (PIII) technology was used to inject zinc and silver binary ions into the implant nails, the sequence was zinc first and then silver (Zn-Ag-PIII). The specific process parameters are shown in Table 1:

[0041] target pulse arc Injection voltage (kV) -30 Injection pulse width (μs) 450 450 Frequency (Hz) 7 7 Injection time (h) Zinc 1.5 / Silver 1.5 Vacuum (Pa) 3.5×10 -3

[0042] figure 1 It is the depth distribution diagram of zinc and silver on the surface of the dental implant obtained through modification treatment in this embodiment. Depend on figure 1 It can be seen that after the modification treatment of this embodiment, the two elements of zinc and silver are distributed on the surface of the dental implant.

[0043]Fig. 2(a) is the high-resolution sp...

Embodiment 2

[0046] The dental implant nails treated with sandblasting acid were ultrasonically cleaned and then dried naturally for use. Plasma immersion ion implantation (PIII) technology was used to implant zinc and silver binary ions into the implant nails, the sequence was first silver and then zinc (Ag-Zn-PIII). The specific process parameters are shown in Table 2:

[0047] target pulse arc Injection voltage (kV) -15 Injection pulse width (μs) 250 250 Frequency (Hz) 5 5

[0048] Injection time (h) Silver 1.5 / Zinc 1.5 Vacuum (Pa) 3.5×10 -3

[0049] image 3 It is the depth distribution diagram of zinc and silver on the surface of the dental implant obtained through modification treatment in this embodiment. as illustrated:

[0050] After the modification treatment in this embodiment, the two elements of zinc and silver are distributed on the surface of the dental implant.

[0051] Fig. 4(a) is a high-resolutio...

Embodiment 3

[0054] The dental implant nails treated with sandblasting acid were ultrasonically cleaned and then dried naturally for use. Plasma immersion ion implantation (PIII) technology was used to implant zinc and silver binary ions into the dental implant, and the order was zinc-silver co-implantation (Zn / Ag-PIII). The specific process parameters are shown in Table 3:

[0055] target pulse arc Injection voltage (kV) -30 Injection pulse width (μs) 450 450 Frequency (Hz) 9 9 Injection time (h) Zinc 1.5 / Silver 1.5 Vacuum (Pa) 3.5×10 -3

[0056] Figure 5 It is the depth distribution diagram of zinc and silver on the surface of the dental implant obtained through modification treatment in this embodiment. as illustrated:

[0057] After the modification treatment in this embodiment, the two elements of zinc and silver are distributed on the surface of the dental implant.

[0058] Fig. 6(a) is a high-resolution spectrum of t...

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Abstract

The invention relates to a surface modification method for an implant tooth nail by a plasma immersion ion implantation technology. The method comprises exciting a zinc cathode and a silver cathode to respectively serve as a zinc ion plasma source and a silver ion plasma source; and zinc ions and silver ions are injected to the surface of the implant tooth nail by the plasma immersion ion implantation technology for surface modification.

Description

technical field [0001] The invention relates to a method for surface modification of dental implant nails, more precisely, a method for surface modification of dental implant nails by plasma immersion ion implantation technology. Background technique [0002] Teeth refer to highly calcified tissues with a certain shape in the human mouth, which have the functions of chewing, helping pronunciation and maintaining facial shape. Teeth are subject to constant wear and tear during the course of normal use throughout a person's life. In addition, some bad living habits, such as eating sweets and not paying attention to oral health, will cause more serious damage to teeth. There are not a few people with dental problems in modern society. Many people have to face tooth loss and need to plant dentures to alleviate the inconvenience caused by the lack of teeth. [0003] In recent decades, oral implantology has developed rapidly and matured. As a restoration method that is very simi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/48
Inventor 刘宣勇金国栋
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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